Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.59 |
| ▸ | KDM1A | O60341 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 4/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 2/20 | 0.39 |
| ▸ | PLAU | P00749 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | LPL | P06858 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30540403 | 0.92 | TP53 (0.50) | TP53KDM1AALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL241973 | 0.90 | TP53 (0.48) | TP53KDM1AALDH1A1CYP2A6CYP1A2 | |
| SCHEMBL9608258 | 0.80 | ACHE (0.39) | TP53KDM1AALDH1A1CYP2A6CYP1A2 | |
| Ethylbenzene SCHEMBL27405402 | 0.79 | TP53 (0.93) | TP53ALDH1A1CYP2A6CYP1A2RAB9A | |
| Benzene SCHEMBL27406821 | 0.79 | TP53 (0.80) | TP53ALDH1A1CYP2A6CYP1A2RAB9A | |
| SCHEMBL12762155 | 0.79 | ALDH1A1 (0.38) | KDM1AALDH1A1CYP2A6CYP1A2TAAR1 | |
| SCHEMBL12748732 | 0.78 | CALM1 (0.60) | KDM4ELMNAMAPT | |
| SCHEMBL13131224 | 0.77 | TP53 (0.33) | TP53KDM1A | |
| Ethylbenzene SCHEMBL1332452 | 0.76 | — | — | |
| Ethylbenzene SCHEMBL11223212 | 0.76 | TP53 (1.00) | TP53ALDH1A1CYP2A6CYP1A2RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| WO-2017089492-A1 | METHOD FOR SYNTHESIZING IODO- OR ASTATOARENES USING DIARYLIODONIUM SALTS | INSTITUT NATIONAL DE LA SANTE ET DE LA RECHERCHE MEDICALE (INSERM) (FR) | 2017-06-01 | — | — | WO | disclosed |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9188858-B2 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | JSR CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9152044-B2 | — | — | 2015-10-06 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-5153104-A | Negative-acting photothermographic imaging systems comprising also a nitrate, an initiator, a leuco dye and a binder; colorfastness; clean background | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-10-06 | — | — | US | disclosed |
| EP-0500321-A1 | High speed aqueous solvent developable photopolymer compositions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-08-26 | — | — | EP | disclosed |
| WO-1992009934-A1 | PHOTOSENSITIVE MATERIALS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-06-11 | — | — | WO | disclosed |
| US-5102771-A | Containing photoinitiator and polymer containing alkoxyalkyl ester groups | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-04-07 | — | — | US | disclosed |
| EP-0462763-A1 | Thermally developable light-sensitive layers containing photobleachable sensitizers | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-12-27 | — | — | EP | disclosed |
| EP-0302610-A2 | Light sensitive element | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-02-08 | — | — | EP | disclosed |
| EP-0061898-B1 | VISIBLE LIGHT SENSITIVE, THERMALLY DEVELOPABLE IMAGING SYSTEMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-19 | — | — | EP | disclosed |
| US-4460677-A | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4386154-A | ACYLATED LEUCO DYES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-05-31 | — | — | US | disclosed |
| EP-0061898-A1 | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-10-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | TP53 4441/4885KDM1A 1032/4885ALDH1A1 1136/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.