SCHEMBL426599

SCHEMBL426599

CCCO[Si](C)(OCCC)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
ALDH1A1 P00352 2/20 0.35
LTA4H P09960 2/20 0.35
HPGD P15428 1/20 0.35
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
CYP1A2 P05177 1/20 0.33
CYP19A1 P11511 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
PSIP1 O75475 1/20 0.32
TP53 P04637 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
DUT P33316 1/20 0.32
TLR8 Q9NR97 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3294085 0.94 LMNA (0.35) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL19809463 0.90 LMNA (0.35) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL705703 0.89 ESR1 (0.31) ALDH1A1HPGDESR1ESR2CYP19A1
SCHEMBL708763 0.88 LTA4H (0.46) ALDH1A1LTA4HCYP1A2CYP19A1CYP2C9
SCHEMBL2874011 0.86 LTA4H (0.46) LMNAALDH1A1LTA4HCYP1A2CYP19A1
SCHEMBL17391409 0.84 LTA4H (0.44) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL704989 0.83 LMNA (0.38) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL704364 0.83 LMNA (0.38) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL103755 0.82 ESR1 (0.37) ALDH1A1LTA4HHPGDESR1ESR2
SCHEMBL27771519 0.81 LMNA (0.30) LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-1209492-B1 Formation of materials such as waveguides with a refractive index step NAT UNIV IRELAND CORK (IE) 2004-02-04 EP claimed
US-20020142096-A1 Induction gelation; optic diffraction; three-dimensional crosslinking CONNELL ANDREW (IE) 2002-10-03 US claimed
EP-1209492-A1 Formation of materials such as waveguides with a refractive index step National University of Ireland Cork (IE) 2002-05-29 EP claimed
US-4141926-A Method for preparing epoxy-modified silicon resins SHIN-ETSU CHEMICAL CO., LTD. (JP) 1979-02-27 US claimed
WO-2026104032-A1 SILICONE-BASED RESIN COMPOSITION AND METHOD OF PREPARING THE SAME WACKER CHEMIE AG (DE) 2026-05-21 WO disclosed
US-12100804-B2 Alkali ION conducting plastic crystals ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (US) 2024-09-24 US disclosed
US-20240270908-A1 POLYSILSESQUIOXANE COMPOSITION AND CURED PRODUCT NIPPON SHOKUBAI CO., LTD. (JP) 2024-08-15 US disclosed
CN-116082642-B Acryloyloxy alkoxy-terminated polysiloxane, sealant and preparation method and application thereof 广州回天新材料有限公司 2024-07-02 CN disclosed
US-20240120532-A1 Alkali ION Conducting Plastic Crystals ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY 2024-04-11 US disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
CN-117310849-A Optical laminate 住友化学株式会社 2023-12-29 CN disclosed
EP-0649126-B1 Label NOF CORP (JP) 1997-08-13 EP disclosed
EP-0431409-B1 A nonaqueous method for making silicone polymers GEN ELECTRIC (US) 1996-06-12 EP disclosed
US-5506016-A SILICONE RESIN AND INORGANIC MONOCRYSTALLINE FIBER; HEAT RESISTANCE NOF CORPORATION (JP) 1996-04-09 US disclosed
EP-0649126-A1 Label NOF CORPORATION (JP) 1995-04-19 EP disclosed
EP-0431409-A2 A nonaqueous method for making silicone polymers GENERAL ELECTRIC COMPANY (US) 1991-06-12 EP disclosed
US-4950779-A Nonaqueous method for making silicone oligomers GENERAL ELECTRIC COMPANY (US) 1990-08-21 US disclosed
US-4354013-A CHELATE COMPOUND CATALYST TOSHIBA SILICONE CO., LTD. (JP) 1982-10-12 US disclosed