Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL4288971

O=S(=O)(O)C(F)(F)F.Oc1ccc(-c2ccccc2S)cc1

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 2/20 0.41
BACE1 P56817 2/20 0.41
ABL1 P00519 2/20 0.41
ABCB1 P08183 2/20 0.41
BCR P11274 2/20 0.41
KIF11 P52732 2/20 0.39
MEN1 O00255 1/20 0.38
NPC1 O15118 1/20 0.38
HPGDS O60760 1/20 0.38
MAPT P10636 1/20 0.38
PKM P14618 1/20 0.38
MAOB P27338 1/20 0.38
RAB9A P51151 1/20 0.38
KMT2A Q03164 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ESR2 Q92731 3/20 0.38
PDK2 Q15119 1/20 0.37
ESR1 P03372 2/20 0.36
BCL2L1 Q07817 2/20 0.35
MMP3 P08254 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL977832 0.86 BACE1 (0.38) PTPN1BACE1ABL1ABCB1BCR
SCHEMBL2572788 0.86 PTPN1 (0.36) PTPN1BACE1ABL1ABCB1BCR
SCHEMBL2574839 0.82 ABL1 (0.56) PTPN1BACE1ABL1ABCB1BCR
Bromide SCHEMBL4613670 0.80 ABL1 (0.54) PTPN1BACE1ABL1ABCB1BCR
Trifluoromethanesulfonic Acid SCHEMBL28044747 0.80 PTPN1 (0.47) PTPN1BACE1KIF11MEN1NPC1
Trifluoromethanesulfonic Acid SCHEMBL1713466 0.78 KIF11 (0.54) PTPN1ABL1ABCB1BCRKIF11
Trifluoromethanesulfonic Acid SCHEMBL2562560 0.77 CA2 (0.36) PTPN1MEN1NPC1MAPTRAB9A
Biphenyl SCHEMBL27775707 0.77 MMP3 (0.47) PTPN1KIF11MEN1MAPTRAB9A
Trifluoromethanesulfonic Acid SCHEMBL576036 0.76 LMNA (0.52) KIF11MEN1NPC1MAPTPKM
SCHEMBL28881713 0.75 ABL1 (0.57) PTPN1BACE1ABL1ABCB1BCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090087782-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2009-04-02 US disclosed
EP-1963919-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2008-09-03 EP disclosed
EP-1915360-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2008-04-30 EP disclosed
WO-2007057773-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-05-24 WO disclosed
WO-2007007175-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2007-01-18 WO disclosed