Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.31 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703604 | 0.98 | ESR1 (0.37) | MAPK1ALDH1A1ALOX15ESR1ESR2 | |
| SCHEMBL432711 | 0.91 | MAPK1 (0.34) | MAPK1ALDH1A1ALOX15ESR1ESR2 | |
| SCHEMBL24442805 | 0.83 | NPSR1 (0.31) | MAPK1TSHR | |
| SCHEMBL2498900 | 0.83 | ALDH1A1 (0.43) | ALDH1A1TSHR | |
| SCHEMBL2504307 | 0.82 | PAX8 (0.33) | ALDH1A1ESR1ESR2TSHRHSD17B10 | |
| SCHEMBL707572 | 0.81 | MAPK1 (0.34) | MAPK1ALDH1A1ALOX15ESR1ESR2 | |
| SCHEMBL191229 | 0.80 | MAPK1 (0.37) | MAPK1ALDH1A1ALOX15ESR1ESR2 | |
| SCHEMBL704060 | 0.80 | MAPK1 (0.37) | MAPK1ALDH1A1ALOX15ESR1ESR2 | |
| SCHEMBL2502697 | 0.79 | TP53 (0.41) | ALDH1A1TSHRTDP1 | |
| SCHEMBL4650377 | 0.79 | MAPK1 (0.39) | MAPK1ALDH1A1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 289 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117413005-A | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2024-01-16 | — | — | CN | disclosed |
| CN-115244109-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| CN-115244109-A | Method for producing siloxane polymer | 东丽精细化工株式会社 | 2022-10-25 | — | — | CN | disclosed |
| US-11033507-B2 | Method of synthesis of silica vesicles and use thereof | THE UNIVERSITY OF QUEENSLAND (AU) | 2021-06-15 | — | — | US | disclosed |
| US-20210173309-A1 | METHOD OF FORMING REVERSED PATTERN AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-06-10 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6235101-B1 | SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |