SCHEMBL43153

SCHEMBL43153

C=CC(=O)OC(COP(=O)(O)O)(OC(=O)C=C)OC(=O)C=C

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.37
TP53 P04637 3/20 0.37
HIF1A Q16665 3/20 0.37
CYP3A4 P08684 2/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
LPAR2 Q9HBW0 1/20 0.35
LPAR3 Q9UBY5 1/20 0.35
THRB P10828 1/20 0.35
TSHR P16473 5/20 0.32
HSD17B10 Q99714 1/20 0.32
TPI1 P60174 1/20 0.31
PGK1 P00558 1/20 0.31
PGK2 P07205 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL21840397 0.95 LMNA (0.34) ALDH1A1TP53HIF1ACYP3A4MAPK1
Methacrylic Acid SCHEMBL2510827 0.89 THRB (0.33) ALDH1A1TP53HIF1ACYP3A4MAPK1
Acrylic Acid SCHEMBL8927659 0.86 ALDH1A1 (0.46) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL23928835 0.84 ALDH1A1 (0.34) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL26108411 0.81 THRB (0.37) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL3062834 0.80 THRB (0.39) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL15163253 0.79 THRB (0.38) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL10783552 0.78 THRB (0.37) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL43154 0.77 ALDH1A1 (0.46) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL26109220 0.76 THRB (0.36) ALDH1A1TP53HIF1ACYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 568 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7193226-B2 Scratch resistant moisture-protecting parylene layers AGFA-GEVAERT (BE) 2007-03-20 US claimed
EP-1541333-A1 Scratch resistant moisture-protecting parylene layers Agfa-Gevaert (BE) 2005-06-15 EP claimed
US-20050067584-A1 Scratch resistant moisture-protecting parylene layers AGFA NV (BE) 2005-03-31 US claimed
EP-0989172-A1 Adhesive composition for metal foil, adhesive-coated metal foil, metal clad laminate and related materials using the same HITACHI CHEMICAL CO., LTD. (JP) 2000-03-29 EP claimed
JP-7140657-A None JP disclosed
JP-7140656-A None JP disclosed
US-12585208-B2 Glittering toner, toner-storing unit, developer, developer-storing unit,image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2026-03-24 US disclosed
EP-4709813-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION Rolic Technologies AG (CH) 2026-03-18 EP disclosed
EP-3624199-B1 DISPLAY DEVICE SAMSUNG DISPLAY CO LTD (KR) 2026-03-18 EP disclosed
US-12455407-B2 Adhesive film, optical member comprising the same and optical display comprising the same SAMSUNG SDI CO., LTD. (KR) 2025-10-28 US disclosed
EP-4603539-A1 POLYLACTIC ACID RESIN COMPOSITION FOR INJECTION BLOW MOLDING, METHOD FOR PRODUCING POLYLACTIC ACID RESIN COMPOSITION, INJECTION BLOW MOLDED BODY, AND METHOD FOR PRODUCING INJECTION BLOW MOLDED BODY Nissei Plastic Industrial Co., Ltd. (JP) 2025-08-20 EP disclosed
US-12384938-B2 Adhesive film and display member including the same SAMSUNG SDI CO., LTD. (KR) 2025-08-12 US disclosed
US-4544625-A SOLDERING MASK FOR PRINTED CIRCUITS HITACHI CHEMICAL COMPANY, LTD. (JP) 1985-10-01 US disclosed
US-4542164-A BROMINATED BISPHENOL A EPOXY RESIN, THEMOPLASTIC TORAY INDUSTRIES, INCORPORATED (JP) 1985-09-17 US disclosed
US-4405705-A HYDROPHILIC TOYO BOSEKI KABUSHIKI KAISHA T/A TOYOBA CO., LTD. (JP) 1983-09-20 US disclosed
US-4272607-A POLYMER OF A TETRAHYDROFURFURYL ACRYLATE, UNSATURATED COMPOUND AND INITIATOR HITACHI CHEMICAL COMPANY, LTD. (JP) 1981-06-09 US disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4187112-A Photosensitive plate containing nitrogen containing condensation type polyesters TOYOBO CO., LTD. (JP) 1980-02-05 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed
US-4012559-A Radiation curable coating composition and precoated metal having top coat based on the same TORAY INDUSTRIES, INC (JA) 1977-03-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12585208-B2 Glittering toner, toner-storing unit, developer, developer-storing unit,image forming apparatus, and image forming method SP1, PAX2, SNAP23 ALDH1A1 477/4885TP53 817/4885HIF1A 1141/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.