SCHEMBL434675

SCHEMBL434675

C=CC(=O)OCCCOC(=O)c1ccccc1

nearest known ligand 0.68

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.68
THRB P10828 1/20 0.57
LMNA P02545 1/20 0.54
TSHR P16473 5/20 0.53
ALDH1A1 P00352 4/20 0.53
CYP3A4 P08684 1/20 0.53
HPGD P15428 1/20 0.49
HIF1A Q16665 3/20 0.47
MAPK1 P28482 1/20 0.47
SLC6A2 P23975 1/20 0.47
SLC6A3 Q01959 1/20 0.47
KMT2A Q03164 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.45
TP53 P04637 2/20 0.44
AKT1 P31749 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL433209 0.97 TDP1 (0.73) TDP1THRBLMNATSHRALDH1A1
SCHEMBL9647800 0.95 TDP1 (0.71) TDP1THRBLMNATSHRALDH1A1
SCHEMBL888081 0.95 TDP1 (0.71) TDP1THRBLMNATSHRALDH1A1
SCHEMBL8729392 0.95 TDP1 (0.71) TDP1THRBLMNATSHRALDH1A1
SCHEMBL434163 0.93 THRB (0.65) TDP1THRBLMNATSHRALDH1A1
SCHEMBL29315934 0.91 TDP1 (0.56) TDP1THRBLMNATSHRALDH1A1
SCHEMBL9503942 0.91 TDP1 (0.65) TDP1THRBLMNATSHRALDH1A1
SCHEMBL22667631 0.89 ALDH1A1 (0.61) TDP1THRBLMNATSHRALDH1A1
SCHEMBL10493437 0.89 TSHR (0.52) TDP1THRBLMNATSHRALDH1A1
SCHEMBL28027210 0.89 TSHR (0.52) TDP1THRBLMNATSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109021858-A A kind of weather-proof release film and preparation method thereof 江苏优珀斯材料科技有限公司 2018-12-18 CN disclosed
CN-108839416-A A kind of high surface energy self-adhesive film and preparation method thereof 江苏优珀斯材料科技有限公司 2018-11-20 CN disclosed
CN-108842932-A A kind of high guarantor's clay soil/polyolefin antiadhesion barrier and preparation method thereof 江苏优珀斯材料科技有限公司 2018-11-20 CN disclosed
CN-103429688-A Resin paste composition for bonding semiconductor element, and semiconductor device HITACHI CHEMICAL CO LTD 2013-12-04 CN disclosed
CN-103180965-A Solar cell module HITACHI CHEMICAL CO LTD 2013-06-26 CN disclosed
CN-103140936-A Solar cell module HITACHI CHEMICAL CO LTD 2013-06-05 CN disclosed
WO-2012010918-A2 OPTICAL DEVICES MEDICONTUR ORVOSTECHNIKAI KFT. (HU) 2012-01-26 WO disclosed
CN-102027058-A A curable composition and use thereof NAT STARCH & CHEMICAL INVEST H 2011-04-20 CN disclosed
EP-0313476-B1 AN OPTICAL ARTICLE CONTAINING A POLYMERIC MATRIX EXHIBITING A HIGH LEVEL OF SECOND ORDER POLARIZATION SUSCEPTIBILITY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1992-12-23 EP disclosed
EP-0313475-B1 AN OPTICAL ARTICLE CONTAINING A TRANSMISSION MEDIUM EXHIBITING A HIGH LEVEL OF SECOND ORDER POLARIZATION SUSCEPTIBILITY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1992-12-23 EP disclosed
EP-0313475-A2 An optical article containing a transmission medium exhibiting a high level of second order polarization susceptibility EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-04-26 EP disclosed
EP-0313476-A2 An optical article containing a polymeric matrix exhibiting a high level of second order polarization susceptibility EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-04-26 EP disclosed
EP-0300203-A2 Photoresist composition comprising cyclohexyleneoxyalkyl acrylates EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-01-25 EP disclosed
US-4796971-A CHARGE TRANSFER COMPOUND ON CROSSLINKED MATRIX EASTMAN KODAK COMPANY (US) 1989-01-10 US disclosed
US-4792208-A POLAR ALIGNED NONCENTROSYMMETRIC MOLECULAR DIPOLES; SULFONYL MOIETY AS ELECTRON ACCEPTOR EASTMAN KODAK COMPANY (US) 1988-12-20 US disclosed
EP-0129234-B1 ELECTROPHOTOGRAPHIC ELEMENTS HAVING BARRIER LAYERS OF CROSSLINKED POLYMERS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-11-04 EP disclosed
EP-0184482-A1 Thermotropical polymers with chiral lateral chains, and process for their preparation THOMSON-CSF (FR) 1986-06-11 EP disclosed
EP-0129234-A1 Electrophotographic elements having barrier layers of crosslinked polymers EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-12-27 EP disclosed
US-4485161-A Electrophotographic elements having barrier layers of crosslinked polymers of aliphatic or aromatic monomers containing α,β-ethylenically unsaturated carbonyl-containing substituents EASTMAN KODAK COMPANY (US) 1984-11-27 US disclosed
US-4322490-A Photopolymerizable compositions featuring improved monomers EASTMAN KODAK COMPANY (US) 1982-03-30 US disclosed