Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5014889 | 0.96 | — | — | |
| Ammonia Solution, Strong SCHEMBL7048356 | 0.96 | — | — | |
| SCHEMBL29032518 | 0.96 | — | — | |
| SCHEMBL5013984 | 0.96 | — | — | |
| SCHEMBL9495942 | 0.92 | ALDH1A1 (0.31) | ALDH1A1TSHR | |
| SCHEMBL17356129 | 0.89 | LMNA (0.33) | — | |
| SCHEMBL7048355 | 0.89 | — | — | |
| SCHEMBL5011958 | 0.87 | LMNA (0.38) | — | |
| SCHEMBL21625240 | 0.87 | LMNA (0.38) | — | |
| SCHEMBL28699611 | 0.87 | LMNA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115394641-A | Nitrogen-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-107924842-B | Nitrogen-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-113130988-A | Electrolyte and electrochemical device using same | 深圳市研一新材料有限责任公司 | 2021-07-16 | — | — | CN | claimed |
| CN-113130993-A | Electrolyte and electrochemical device thereof | 深圳市研一新材料有限责任公司 | 2021-07-16 | — | — | CN | claimed |
| US-20190326126-A1 | METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | AIR LIQUIDE ELECTRONICS U.S. LP | 2019-10-24 | — | — | US | claimed |
| US-10347498-B2 | Methods of minimizing plasma-induced sidewall damage during low K etch processes | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2019-07-09 | — | — | US | claimed |
| EP-3312929-B1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME | SOULBRAIN CO LTD (KR) | 2019-04-17 | — | — | EP | claimed |
| US-10256109-B2 | Nitrogen-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2019-04-09 | — | — | US | claimed |
| US-20180211845-A1 | METHODS OF MINIMIZING PLASMA-INDUCED SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-07-26 | — | — | US | claimed |
| EP-3345211-A1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-07-11 | — | — | EP | claimed |
| CN-107924842-A | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | 乔治洛德方法研究和开发液化空气有限公司 | 2018-04-17 | — | — | CN | claimed |
| US-20170229316-A1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE AMERICAN (US) | 2017-08-10 | — | — | US | claimed |
| US-9659788-B2 | Nitrogen-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2017-05-23 | — | — | US | claimed |
| US-20170110336-A1 | METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-04-20 | — | — | US | claimed |
| WO-2017040518-A1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2017-03-09 | — | — | WO | claimed |
| US-20150371869-A1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AMERICAN AIR LIQUIDE, INC. | 2015-12-24 | — | — | US | claimed |
| EP-3345211-B1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE (FR) | 2025-12-10 | — | — | EP | disclosed |
| EP-4220805-A2 | ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, AND ELECTRONIC DEVICE | Ningde Amperex Technology Limited (CN) | 2023-08-02 | — | — | EP | disclosed |
| US-4125513-A | Thermoplastic compositions containing triazine polymer coated reinforcing agents | TEXACO INC. (US) | 1978-11-14 | — | — | US | disclosed |
| US-4100147-A | Polymerization of aliphatic nitriles | TEXACO INC. (US) | 1978-07-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10256109-B2 | Nitrogen-containing compounds for etching semiconductor structures | NCF1, C9, MSN | ALDH1A1 4541/4885TSHR 4339/4885 |
| US-20150371869-A1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | NCF1, C9, MSN | ALDH1A1 4541/4885TSHR 4339/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.