SCHEMBL438937

SCHEMBL438937

CCCCOC(CC)OC

nearest known ligand 0.36

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.36
ADRB1 P08588 1/20 0.36
ADRB3 P13945 1/20 0.36
DNM1 Q05193 1/20 0.35
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26986860 1.00 ADRB2 (0.36) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL4926243 0.91 DNM1 (0.47) DNM1CA1CA2TSHR
SCHEMBL15384178 0.91 DNM1 (0.47) DNM1CA1CA2TSHR
SCHEMBL2311733 0.87 ADRB2 (0.41) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL439942 0.84
SCHEMBL6376881 0.83 ADRB2 (0.35) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL16478006 0.83 ADRB2 (0.35) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL5918657 0.83 ADRB2 (0.35) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL458260 0.83
SCHEMBL6375692 0.82 ADRB2 (0.38) ADRB2ADRB1ADRB3DNM1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9678426-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9678426-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9678425-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9678425-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-8993212-B2 Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-03-31 US disclosed
WO-2010140483-A1 FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD セントラル硝子株式会社 (JP) 2010-12-09 WO disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1059279-B1 Polyvinyl ether compound and method of preperation IDEMITSU KOSAN CO (JP) 2005-08-17 EP disclosed
EP-1059279-A1 Polyvinyl ether compound and method of preperation IDEMITSU KOSAN CO., LTD. (JP) 2000-12-13 EP disclosed
EP-0644175-B1 POLYVINYL ETHER COMPOUND AND LUBRICATING OIL IDEMITSU KOSAN CO (JP) 1999-10-20 EP disclosed
US-5616812-A POLYMERIZING VINYL ETHER IN THE PRESENCE OF CATALYST AND SPECIFIC ACETAL IDEMITSU KOSAN CO., LTD. (JP) 1997-04-01 US disclosed
US-5589597-A HYDROGENATION IDEMITSU KOSAN CO., LTD. (JP) 1996-12-31 US disclosed
US-5523491-A REACTING ACETAL OR KETAL COMPOUND WITH HYDROGEN IN PRESENCE OF HYDROGENATION AND SOLID ACID CATALYSTS IDEMITSU KOSAN CO., LTD. (JP) 1996-06-04 US disclosed
EP-0644175-A1 POLYVINYL ETHER COMPOUND AND LUBRICATING OIL IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-03-22 EP disclosed
US-5399631-A Polyvinyl ether compound IDEMITSU KOSAN CO., LTD. (JP) 1995-03-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer ADH1A, ADH1C, ADH5 ADRB2 879/4885ADRB1 1084/4885ADRB3 1067/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.