SCHEMBL4402533

SCHEMBL4402533

COc1cccc2c1CC1C3CC(C21)C1C2CC(C4C5C=CC(C5)C24)C31

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.39
CYP11B2 P19099 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
ADRA1A P35348 1/20 0.34
ACHE P22303 1/20 0.34
HRH2 P25021 3/20 0.33
SLC6A4 P31645 3/20 0.33
HRH1 P35367 2/20 0.33
ADRA2A P08913 1/20 0.33
ADRA2C P18825 2/20 0.33
CHRM4 P08173 1/20 0.33
DRD3 P35462 4/20 0.33
DRD2 P14416 3/20 0.33
HTR2A P28223 2/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A3 Q01959 1/20 0.33
SIGMAR1 Q99720 1/20 0.32
CHRM2 P08172 2/20 0.32
CHRM1 P11229 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408082 0.97 CYP19A1 (0.40) CYP19A1CYP11B2MEN1KMT2AADRA1A
SCHEMBL4403294 0.81 CYP19A1 (0.44) CYP19A1CYP11B2MEN1KMT2AADRA1A
SCHEMBL14980967 0.78
SCHEMBL4401575 0.74 MTNR1A (0.37)
SCHEMBL4745407 0.74
SCHEMBL4405540 0.73 DPP4 (0.37) SLC6A4HRH1HTR2ASLC6A2SLC6A3
SCHEMBL4401569 0.71 CHRNB2 (0.42) CYP19A1DRD3DRD2HTR2ADRD4
SCHEMBL4408092 0.71 MTNR1A (0.35) MEN1KMT2A
SCHEMBL4403405 0.68 MEN1 (0.39) CYP19A1CYP11B2MEN1KMT2AACHE
SCHEMBL4443408 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed