Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | MMP8 | P22894 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.35 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | MGAM | O43451 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | SI | P14410 | 1/20 | 0.34 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.34 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12482713 | 0.84 | MMP8 (0.35) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL892045 | 0.82 | MMP8 (0.41) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL20725836 | 0.81 | MMP8 (0.37) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL28502182 | 0.81 | MMP8 (0.42) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL1682735 | 0.78 | CYP4F2 (0.41) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL14504422 | 0.78 | MMP8 (0.43) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL954289 | 0.78 | MMP8 (0.43) | ALDH1A1MMP8PKMMEN1KMT2A | |
| SCHEMBL8863698 | 0.78 | MAPT (0.43) | MEN1KMT2ALMNAMAPT | |
| SCHEMBL8864408 | 0.78 | MAPT (0.43) | MEN1KMT2ALMNAMAPT | |
| SCHEMBL22552602 | 0.78 | MAPT (0.43) | MEN1KMT2ALMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2650276-B1 | METHOD FOR PRODUCING BETA-FLUOROALCOHOL | CENTRAL GLASS CO LTD (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-8765355-B2 | Radiation sensitive resin composition, method for forming a pattern, polymer and compound | JSR CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8765355-B2 | Radiation sensitive resin composition, method for forming a pattern, polymer and compound | JSR CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8658840-B2 | Method for producing β-fluoroalcohol | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-02-25 | — | — | US | disclosed |
| WO-2010044372-A1 | FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2010-04-22 | — | — | WO | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | ALDH1A1 2430/4885MMP8 4778/4885PKM 3084/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | ALDH1A1 3871/4885MMP8 3503/4885PKM 2234/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.