SCHEMBL442346

SCHEMBL442346

CC1(C)CC(CC(N)=O)CC(C)(C)N1O

nearest known ligand 0.38

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 1/20 0.33
ALOX15 P16050 1/20 0.33
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.31
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5186761 0.84 TSHR (0.32)
SCHEMBL22472188 0.84 CA1 (0.33)
SCHEMBL316381 0.82 GAA (0.39) GAAL3MBTL1KDM4EALDH1A1ALOX15
SCHEMBL13411242 0.82 GAA (0.39) GAAL3MBTL1KDM4EALDH1A1ALOX15
SCHEMBL17282680 0.77 BRD4 (0.44) GAAL3MBTL1KDM4EALDH1A1ALOX15
SCHEMBL14495290 0.77 GAA (0.35) GAAL3MBTL1KDM4EALDH1A1ALOX15
SCHEMBL25332990 0.77 APLNR (0.30)
SCHEMBL23355264 0.77 GAA (0.41) GAAL3MBTL1KDM4EKMT2A
SCHEMBL6895591 0.77 TSHR (0.43) GAAALDH1A1KMT2A
SCHEMBL13957887 0.76 ALDH1A1 (0.34) GAAL3MBTL1KDM4EALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115261894-A Method for synthesizing p-cymene by using terpinene electrooxidation 中南林业科技大学 2022-11-01 CN claimed
US-8138268-B2 Adhesive composition, circuit connecting material, connecting structure for circuit member, and semiconductor device HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-03-20 US claimed
US-20240162466-A1 CARBON DIOXIDE ADSORPTION BATTERY AND CHARGE/DISCHARGE DEVICE KURARAY CO., LTD. (JP) 2024-05-16 US disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
EP-3992254-B1 COMPOSITION, FILM, AND OPTICAL SENSOR FUJIFILM CORP (JP) 2024-02-21 EP disclosed
US-11901593-B2 Air battery and method for using the same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2024-02-13 US disclosed
EP-4310556-A1 FILM AND PHOTOSENSOR FUJIFILM Corporation (JP) 2024-01-24 EP disclosed
EP-3971229-B1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO LTD (JP) 2024-01-03 EP disclosed
EP-4287362-A1 CARBON DIOXIDE ADSORPTION BATTERY AND CHARGE/DISCHARGE DEVICE Kuraray Co., Ltd. (JP) 2023-12-06 EP disclosed
US-20230357558-A1 RESIN COMPOSITION, PREPREG USING SAME, FILM PROVIDED WITH RESIN, METAL FOIL PROVIDED WITH RESIN, METAL-CLAD LAMINATE, AND WIRING BOARD PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2023-11-09 US disclosed
US-11685799-B2 Composite particles, method of producing composite particles, dry powder, and molding resin composition TOPPAN PRINTING CO., LTD. (JP) 2023-06-27 US disclosed
US-7321057-B2 Method for manufacturing prostaglandin analogue R-TECH UENO, LTD. (JP) 2008-01-22 US disclosed
EP-1857456-A1 PROCESS FOR PRODUCING COMPOUND WITH ANTI-HCV POTENCY AND INTERMEDIATE FOR USE THEREIN CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2007-11-21 EP disclosed
EP-1816173-A1 Manufacturing method of nonaqueous pigment dispersion liquid, and ink composition, ink jet recording composition, image forming method and recorded material using the same FUJIFILM Corporation (JP) 2007-08-08 EP disclosed
EP-1754762-A1 ADHESIVE COMPOSITION, CIRCUIT CONNECTING MATERIAL, CONNECTING STRUCTURE FOR CIRCUIT MEMBER, AND SEMICONDUCTOR DEVICE Hitachi Chemical Co., Ltd. (JP) 2007-02-21 EP disclosed
US-20060036108-A1 Method for manufacturing prostaglandin analogue R-TECH UENO, LTD. 2006-02-16 US disclosed
US-20050240050-A1 Process for production of formylcyclopropanecarboxylic ester SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-10-27 US disclosed
EP-1564591-A2 Polymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 2005-08-17 EP disclosed
US-20050170285-A1 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJI PHOTO FILM CO., LTD. 2005-08-04 US disclosed
EP-1535895-A1 PROCESS FOR PRODUCTION OF FORMYLCYCLOPROPANECARBOXYLIC ESTERS Sumitomo Chemical Company, Limited (JP) 2005-06-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060036108-A1 Method for manufacturing prostaglandin analogue PTGES, PTGES2, PTGIS GAA 3121/4885L3MBTL1 3539/4885KDM4E 1151/4885
US-20050240050-A1 Process for production of formylcyclopropanecarboxylic ester AHCYL1, HACL2, CBR1 GAA 4789/4885L3MBTL1 3477/4885KDM4E 2944/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.