SCHEMBL444489

SCHEMBL444489

CC(C)OCC(C)C(=O)OC(C)C

nearest known ligand 0.40

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.40
LMNA P02545 2/20 0.33
HCAR2 Q8TDS4 1/20 0.32
PRKCA P17252 1/20 0.31
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8930253 0.90 CYP3A4 (0.35) TSHRLMNAALOX15
SCHEMBL10272235 0.81 SMN1; SMN2 (0.39) TSHR
SCHEMBL13502940 0.81 TSHR (0.31) TSHR
SCHEMBL445988 0.81 SMN1; SMN2 (0.39) TSHR
SCHEMBL10404865 0.81 TSHR (0.40) TSHRLMNAHCAR2ALOX15
SCHEMBL443632 0.79 ALDH1A1 (0.40) LMNAALOX15
SCHEMBL3890538 0.79 TSHR (0.39) TSHRLMNAHCAR2
SCHEMBL28851179 0.79 PRKCA (0.52) TSHRPRKCA
SCHEMBL10405112 0.77 TSHR (0.37) TSHRLMNAHCAR2ALOX15
SCHEMBL20221792 0.77 TSHR (0.37) TSHRLMNAHCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5612303-A HYDROXY OR ETHERIFIED ESTERS NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1997-03-18 US claimed
US-10916437-B2 Methods of forming micropatterns and substrate processing apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-02-09 US disclosed
EP-2450412-B1 Silicone coating composition MERCK PATENT GMBH (DE) 2019-08-28 EP disclosed
US-20190198342-A1 Methods of Forming Micropatterns and Substrate Processing Apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-27 US disclosed
EP-2102156-B1 PHOTOACTIVE COMPOUNDS MERCK PATENT GMBH (DE) 2019-06-26 EP disclosed
US-10134606-B2 Method of forming patterns and method of manufacturing integrated circuit device using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-11-20 US disclosed
US-9773672-B2 Method of forming micropatterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-09-26 US disclosed
US-20160233083-A1 METHOD OF FORMING MICROPATTERNS SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-08-11 US disclosed
US-9337032-B2 Method of forming pattern of semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-05-10 US disclosed
US-20150340246-A1 METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-26 US disclosed
WO-2007007175-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2007-01-18 WO disclosed
US-20060131240-A1 Process for treating solvents AZ ELECTRONIC MATERIALS USA CORP. 2006-06-22 US disclosed
US-6888020-B2 Water-soluble dithioesters and method for polymerization thereof LG CHEM, LTD. (KR) 2005-05-03 US disclosed
EP-1467966-A2 WATER-SOLUBLE DITHIOESTERS AND METHOD FOR POLYMERIZATION THEREOF LG Chem, Ltd. (KR) 2004-10-20 EP disclosed
US-20040138492-A1 Water-soluble dithioesters and method for polymerization thereof LG CHEM, LTD. (KR) 2004-07-15 US disclosed
US-20040067437-A1 Coating compositions for use with an overcoated photoresist SHIPLEY COMPANY, L.L.C. 2004-04-08 US disclosed
WO-2003062280-A2 WATER-SOLUBLE DITHIOESTERS AND METHOD FOR POLYMERIZATION THEREOF LG CHEM, LTD. (KR) 2003-07-31 WO disclosed
EP-1298493-A2 Coating compositions for use with an overcoated photoresist Shipley Company LLC (US) 2003-04-02 EP disclosed
US-4978754-A REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1990-12-18 US disclosed
EP-0321256-A2 Process of preparing unsaturated carboxylic acid amides MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-06-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040138492-A1 Water-soluble dithioesters and method for polymerization thereof TST, TTPA, TMT1A TSHR 3778/4885LMNA 4288/4885HCAR2 4448/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.