SCHEMBL4446235

SCHEMBL4446235

O=P(O)(O)Cc1ccc(Sc2ccc(OCO)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGK1 P00558 5/20 0.41
PGK2 P07205 5/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
MMP12 P39900 1/20 0.41
PTPN1 P18031 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.40
LMNA P02545 2/20 0.40
GAA P10253 1/20 0.39
HPGD P15428 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
ENPP2 Q13822 1/20 0.38
THRB P10828 2/20 0.37
PTPRC P08575 1/20 0.36
PTPN2 P17706 1/20 0.36
PTPRB P23467 1/20 0.36
PTPN6 P29350 1/20 0.36
CDC25A P30304 1/20 0.36
PTPN11 Q06124 1/20 0.36
THRA P10827 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914970 0.88 MMP2 (0.42) PGK1PGK2MMP2MMP9MMP12
SCHEMBL4439201 0.85 PTPN1 (0.56) PGK1PGK2PTPN1ENPP2THRB
SCHEMBL4447157 0.85 PGK1 (0.44) PGK1PGK2MMP2PTPN1ENPP2
SCHEMBL4439215 0.84 SMN1; SMN2 (0.39) MMP2MMP9MMP12PTPN1SMN1; SMN2
SCHEMBL915289 0.83 MMP2 (0.44) PGK1PGK2MMP2MMP9MMP12
SCHEMBL4440821 0.81 GAA (0.45) PGK1PGK2PTPN1SMN1; SMN2LMNA
SCHEMBL4439210 0.79 ALDH1A1 (0.46) PGK1PGK2MMP2MMP9MMP12
SCHEMBL31688374 0.78 PGK1 (0.47) PGK1PGK2PTPN1SMN1; SMN2LMNA
SCHEMBL915395 0.78 NR1H2 (0.54) PGK1PGK2MMP2MMP9MMP12
SCHEMBL914969 0.77 PGK1 (0.45) PGK1PGK2MMP2MMP9MMP12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed