SCHEMBL915289

SCHEMBL915289

COCCOc1ccc(Sc2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP12 P39900 1/20 0.44
SMN1; SMN2 Q16637 3/20 0.40
LMNA P02545 2/20 0.40
ACACB O00763 1/20 0.40
GAA P10253 1/20 0.40
HPGD P15428 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ENPP2 Q13822 1/20 0.39
PGK1 P00558 4/20 0.38
PGK2 P07205 4/20 0.38
MAPT P10636 1/20 0.38
PTPN1 P18031 1/20 0.38
S1PR2 O95136 2/20 0.38
S1PR1 P21453 2/20 0.38
S1PR3 Q99500 2/20 0.38
LPAR2 Q9HBW0 2/20 0.38
THRB P10828 1/20 0.37
KDM1A O60341 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915764 0.91 ENPP2 (0.45) ACACBENPP2PGK1PGK2MAPT
SCHEMBL914970 0.87 MMP2 (0.42) MMP2MMP9MMP12SMN1; SMN2LMNA
SCHEMBL915789 0.86 PTPN1 (0.51) ACACBENPP2PGK1PGK2MAPT
SCHEMBL31187555 0.86 KDM4E (0.45) SMN1; SMN2LMNAACACBENPP2PGK1
SCHEMBL915416 0.86 CHEK2 (0.42) MMP2MMP9MMP12ACACBENPP2
SCHEMBL915653 0.86 CYP1A2 (0.43) ACACBENPP2PGK1PGK2MAPT
SCHEMBL915294 0.86 SMN1; SMN2 (0.37) MMP2MMP9MMP12SMN1; SMN2LMNA
SCHEMBL4446235 0.83 PGK1 (0.41) MMP2MMP9MMP12SMN1; SMN2LMNA
SCHEMBL915544 0.82 MAPT (0.49) SMN1; SMN2LMNAACACBGAAMAPT
SCHEMBL16195434 0.82 KDM1A (0.46) SMN1; SMN2LMNAGAAHPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed