SCHEMBL444972

SCHEMBL444972

CCC1=C(c2ccccc2)C2CCC1C2

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 1/20 0.35
SLC6A3 Q01959 4/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNA4 P43681 1/20 0.33
TP53 P04637 1/20 0.32
DRD2 P14416 1/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
KDM4E B2RXH2 1/20 0.31
SLC18A3 Q16572 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
AKR1C3 P42330 1/20 0.30
AKR1C1 Q04828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15104929 0.92 SLC6A3 (0.35) PTGS2SLC6A3
SCHEMBL2500697 0.81 CHRNB2 (0.36) PTGS2SLC6A3CHRNB2CHRNA4NPC1
SCHEMBL3902761 0.80 PTGS2 (0.43) PTGS2SLC6A3CHRNB2CHRNA4NPC1
SCHEMBL3902729 0.79 HRH3 (0.37)
SCHEMBL2779049 0.75 PTGS2 (0.38) PTGS2SLC6A3CHRNB2CHRNA4NPC1
SCHEMBL10735200 0.69 TAAR1 (0.44) SLC6A3KDM4ESLC18A3
SCHEMBL10742513 0.69 KDM4E (0.39) SLC6A3RAB9AKDM4E
SCHEMBL31108137 0.68 ALDH1A1 (0.38) TP53KDM4E
SCHEMBL2011374 0.65
SCHEMBL3900259 0.64 APP (0.41) CHRNB2CHRNA4NPC1RAB9ACHRNB4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9366956-B2 Self-imageable layer forming polymer and compositions thereof PROMERUS, LLC (US) 2016-06-14 US claimed
US-20140205948-A1 SELF-IMAGEABLE LAYER FORMING POLYMER AND COMPOSITIONS THEREOF SUMITOMO BAKELITE CO., LTD. (JP) 2014-07-24 US claimed
US-8200058-B2 Light guide and light guide structure SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-06-12 US claimed
US-20100067861-A1 LIGHT GUIDE AND LIGHT GUIDE STRUCTURE SUMITOMO BAKELITE COMPANY LIMITED (JP) 2010-03-18 US claimed
EP-2083293-A1 LIGHT GUIDE AND LIGHT GUIDE STRUCTURE Sumitomo Bakelite Company, Ltd. (JP) 2009-07-29 EP claimed
EP-3417033-B1 FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL MERCK PATENT GMBH (DE) 2021-02-24 EP disclosed
US-10840448-B2 Formulation of an organic functional material MERCK PATENT GMBH (DE) 2020-11-17 US disclosed
US-20190044067-A1 FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL MERCK PATENT GMBH (DE) 2019-02-07 US disclosed
EP-3417033-A1 FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL Merck Patent GmbH (DE) 2018-12-26 EP disclosed
WO-2017140404-A1 FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL MERCK PATENT GMBH (DE) 2017-08-24 WO disclosed
US-9366956-B2 Self-imageable layer forming polymer and compositions thereof PROMERUS, LLC (US) 2016-06-14 US disclosed
EP-2731994-B1 POLYMER AND COMPOSITIONS THEREOF FOR FORMING PATTERNED LAYERS AFTER IMAGE-WISE EXPOSURE TO ACTINIC RADIATION SUMITOMO BAKELITE CO (JP) 2016-05-04 EP disclosed
US-20080073741-A1 provide strong bonds while also being readily removed with little or no residues; reworkable; semiconductor; norbornene-type polymer derived from phenethyl norbornene, or glycidyl methyl ether norbornene or decyl norbornene PROMERUS LLC (US) 2008-03-27 US disclosed
US-7312292-B2 Polycyclic polymers containing pendant ion conducting moieties PROMERUS LLC (US) 2007-12-25 US disclosed
US-20070232026-A1 Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC (US) 2007-10-04 US disclosed
US-20070148566-A1 Optical waveguides and methods thereof SUMITOMO BAKELITE CO., LTD. (JP) 2007-06-28 US disclosed
EP-1771491-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS Promerus, LLC (US) 2007-04-11 EP disclosed
WO-2006016925-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS PROMERUS LLC (US) 2006-02-16 WO disclosed
US-20060020068-A1 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films PROMERUS, LLC 2006-01-26 US disclosed
US-20050019638-A1 Polycyclic polymers containing pendant ion conducting moieties SUMITOMO BAKELITE CO., LTD. (JP) 2005-01-27 US disclosed