Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 2/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.31 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.31 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL1490293 | 0.93 | PRKCA (0.36) | PRKCANAAAPRKCEPRKCQPRKCD | |
| SCHEMBL181935 | 0.87 | NAAA (0.39) | PRKCANAAAPRKCEPRKCQPRKCD | |
| SCHEMBL104602 | 0.81 | MEN1 (0.34) | ALDH1A1LMNA | |
| Ether SCHEMBL2250844 | 0.81 | PRKCA (0.50) | PRKCAPRKCEPRKCQPRKCDMAPT | |
| SCHEMBL6062167 | 0.80 | NAAA (0.34) | PRKCANAAAPRKCEPRKCQPRKCD | |
| SCHEMBL6062790 | 0.80 | NAAA (0.34) | PRKCANAAAPRKCEPRKCQPRKCD | |
| SCHEMBL181619 | 0.80 | NAAA (0.34) | PRKCANAAAPRKCEPRKCQPRKCD | |
| Propylene Glycol Diacetate SCHEMBL534273 | 0.77 | TSHR (0.42) | PRKCAMAPTALDH1A1LMNA | |
| SCHEMBL17322486 | 0.77 | ALDH1A1 (0.46) | PRKCAPRKCEPRKCQPRKCDMAPT | |
| SCHEMBL181870 | 0.77 | ALDH1A1 (0.46) | PRKCANAAAPRKCEPRKCQPRKCD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 254 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114556216-B | Positive photosensitive resin composition and display element using same | 株式会社东进世美肯 | 2025-04-25 | — | — | CN | claimed |
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| CN-111123644-B | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2024-09-03 | — | — | CN | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | claimed |
| WO-2022145795-A1 | NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX | 주식회사 동진쎄미켐 | 2022-07-07 | — | — | WO | claimed |
| CN-114556216-A | Positive photosensitive resin composition and display element using the same | 株式会社东进世美肯 | 2022-05-27 | — | — | CN | claimed |
| WO-2022065886-A1 | LOW-REFRACTIVE-INDEX THERMOSETTING COMPOSITION, OPTICAL MEMBER FORMED THEREFROM, AND DISPLAY APPARATUS | 주식회사 동진쎄미켐 | 2022-03-31 | — | — | WO | claimed |
| CN-114133484-A | Method for preparing acrylic resin by adopting tubular reactor | 江西联合化工有限公司 | 2022-03-04 | — | — | CN | claimed |
| CN-113260922-A | Positive photosensitive resin composition | 株式会社东进世美肯 | 2021-08-13 | — | — | CN | claimed |
| US-10982061-B2 | Photosensitive resin composition and display device including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-04-20 | — | — | US | claimed |
| CN-105759568-B | Positive photosensitive siloxane resin composition and display device formed using the same | 三星显示有限公司 | 2021-03-19 | — | — | CN | claimed |
| CN-111123644-A | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2020-05-08 | — | — | CN | claimed |
| CN-110967927-A | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2020-04-07 | — | — | CN | claimed |
| US-20200102433-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-04-02 | — | — | US | claimed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | claimed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-20250280668-A1 | DISPLAY DEVICE | LG DISPLAY CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| CN-119638322-A | Environment-friendly recycled concrete and preparation method thereof | 丽洲建设集团有限公司 | 2025-03-18 | — | — | CN | disclosed |
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | disclosed |
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | disclosed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-119213898-A | Display element and photosensitive resin composition for same | 株式会社东进世美肯 | 2024-12-27 | — | — | CN | disclosed |
| CN-108803240-B | Photosensitive resin composition | 株式会社东进世美肯 | 2024-12-03 | — | — | CN | disclosed |
| CN-111123644-B | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2024-09-03 | — | — | CN | disclosed |
| WO-2024158178-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-08-02 | — | — | WO | disclosed |
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| CN-109976097-B | Method of forming micropattern and substrate processing apparatus | 三星电子株式会社 | 2024-06-18 | — | — | CN | disclosed |
| WO-2024112097-A1 | CERAMIC INK COMPOSITION FOR LOW-TEMPERATURE FIRING CAPABLE OF CHEMICAL STRENGTHENING, AND METHOD FOR MANUFACTURING GLASS SUBSTRATE PRINTED WITH SAME | (주)이노시아 | 2024-05-30 | — | — | WO | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-108073042-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2024-01-23 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | disclosed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | disclosed |
| CN-116057089-A | Low refractive thermosetting composition, optical member and display device using the same | 株式会社东进世美肯 | 2023-05-02 | — | — | CN | disclosed |
| CN-108255017-B | Negative photosensitive resin composition | 株式会社东进世美肯 | 2023-03-31 | — | — | CN | disclosed |
| CN-109799680-B | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-115598925-A | Composition for optical sensor, and solid-state imaging element and camera module using the optical sensor | JSR株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-115509086-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-12-23 | — | — | CN | disclosed |
| CN-108241257-B | Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing molded article by plating | 奇美实业股份有限公司 | 2022-11-08 | — | — | CN | disclosed |
| CN-108241258-B | Resin composition for liquid crystal display device, film for liquid crystal display device, and copolymer | 住友化学株式会社 | 2022-10-18 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| WO-2022181419-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND SEMICONDUCTOR DEVICE | 東レ株式会社 | 2022-09-01 | — | — | WO | disclosed |
| WO-2022145795-A1 | NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX | 주식회사 동진쎄미켐 | 2022-07-07 | — | — | WO | disclosed |
| CN-114556216-A | Positive photosensitive resin composition and display element using the same | 株式会社东进世美肯 | 2022-05-27 | — | — | CN | disclosed |
| WO-2022065886-A1 | LOW-REFRACTIVE-INDEX THERMOSETTING COMPOSITION, OPTICAL MEMBER FORMED THEREFROM, AND DISPLAY APPARATUS | 주식회사 동진쎄미켐 | 2022-03-31 | — | — | WO | disclosed |
| CN-114133484-A | Method for preparing acrylic resin by adopting tubular reactor | 江西联合化工有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-104007616-B | Photosensitive resin composition and display device using the same | 三星显示有限公司 | 2022-01-28 | — | — | CN | disclosed |
| CN-106773534-B | Photosensitive resin composition | 株式会社东进世美肯 | 2021-12-21 | — | — | CN | disclosed |
| CN-113260922-A | Positive photosensitive resin composition | 株式会社东进世美肯 | 2021-08-13 | — | — | CN | disclosed |
| CN-106249546-B | Negative photosensitive resin composition | 东进世美肯株式会社 | 2021-07-27 | — | — | CN | disclosed |
| CN-108604061-B | Cured film and positive photosensitive resin composition | 东丽株式会社 | 2021-07-16 | — | — | CN | disclosed |
| CN-107533293-B | Positive photosensitive resin composition for display device and display device comprising same | 株式会社东进世美肯 | 2021-06-22 | — | — | CN | disclosed |
| US-10982061-B2 | Photosensitive resin composition and display device including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-04-20 | — | — | US | disclosed |
| CN-105759568-B | Positive photosensitive siloxane resin composition and display device formed using the same | 三星显示有限公司 | 2021-03-19 | — | — | CN | disclosed |
| CN-107272342-B | Negative photosensitive resin composition | 东友精细化工有限公司 | 2021-03-05 | — | — | CN | disclosed |
| US-10916437-B2 | Methods of forming micropatterns and substrate processing apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-02-09 | — | — | US | disclosed |
| US-10895807-B2 | Cured film and positive photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-01-19 | — | — | US | disclosed |
| CN-105938298-B | Negative photosensitive resin composition, photocured pattern formed by using same and image display device | 东友精细化工有限公司 | 2020-12-29 | — | — | CN | disclosed |
| CN-111999980-A | Chemically amplified positive photosensitive resin composition, protective film and module | 奇美实业股份有限公司 | 2020-11-27 | — | — | CN | disclosed |
| CN-107434941-B | Resin composition and cured film | 住友化学株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-107949876-B | Window substrate, method of manufacturing the same, and image display device having the same | 东友精细化工有限公司 | 2020-07-31 | — | — | CN | disclosed |
| CN-111381442-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-07-07 | — | — | CN | disclosed |
| CN-105319852-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2020-06-26 | — | — | CN | disclosed |
| CN-111324013-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-06-23 | — | — | CN | disclosed |
| CN-106909028-B | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2020-06-05 | — | — | CN | disclosed |
| CN-104730861-B | Positive photosensitive resin composition, photosensitive resin film produced using the same, and display device | 三星SDI株式会社 | 2020-05-26 | — | — | CN | disclosed |
| CN-104011594-B | Photoresist composition | 东进世美肯株式会社 | 2020-04-24 | — | — | CN | disclosed |
| CN-105319845-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2020-04-21 | — | — | CN | disclosed |
| CN-110967927-A | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2020-04-07 | — | — | CN | disclosed |
| US-20200102433-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-04-02 | — | — | US | disclosed |
| CN-105785720-B | Photosensitive resin composition, photocured pattern formed therefrom, and image display device having the same | 东友精细化工有限公司 | 2020-02-07 | — | — | CN | disclosed |
| CN-104937491-B | Photosensitive resin composition and method for forming pattern using the same | 东进世美肯株式会社 | 2020-01-14 | — | — | CN | disclosed |
| CN-105278243-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2020-01-07 | — | — | CN | disclosed |
| CN-104808439-B | Photoresist composition and method for manufacturing thin film transistor substrate | 三星显示有限公司 | 2019-12-31 | — | — | CN | disclosed |
| CN-104793464-B | Photoresist composition, method for forming pattern and method for manufacturing thin film transistor substrate | 三星显示有限公司 | 2019-12-24 | — | — | CN | disclosed |
| CN-104950578-B | Colored photosensitive resin composition and color filter produced therefrom | 东友精细化工有限公司 | 2019-12-06 | — | — | CN | disclosed |
| US-20190198342-A1 | Methods of Forming Micropatterns and Substrate Processing Apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-27 | — | — | US | disclosed |
| US-10324376-B2 | Negative type colored photosensitive resin composition, cured film, element, and display device | TORAY INDUSTRIES, INC. (JP) | 2019-06-18 | — | — | US | disclosed |
| EP-2119744-B1 | TWO-COMPONENT CURING COMPOSITION | SUNSTAR ENGINEERING INC (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-2530524-B1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL CORP (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-20180356727-A1 | CURED FILM AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-12-13 | — | — | US | disclosed |
| US-20180267405-A1 | NEGATIVE TYPE COLORED PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2018-09-20 | — | — | US | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| US-20170293224-A1 | ORGANIC EL DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-9773672-B2 | Method of forming micropatterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-26 | — | — | US | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-9678257-B2 | Photoresist composition for green color filter | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-06-13 | — | — | US | disclosed |
| US-9606436-B2 | Photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2017-03-28 | — | — | US | disclosed |
| US-20170052446-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2017-02-23 | — | — | US | disclosed |
| US-20170023860-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORP (TW) | 2017-01-26 | — | — | US | disclosed |
| US-9541832-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2017-01-10 | — | — | US | disclosed |
| US-20160327709-A1 | PHOTORESIST COMPOSITION FOR GREEN COLOR FILTER | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-11-10 | — | — | US | disclosed |
| US-9448476-B2 | Photoresist composition and method of manufacturing a thin film transistor substrate | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-09-20 | — | — | US | disclosed |
| US-9428606-B2 | Polyfunctional epoxy compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9422446-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2016-08-23 | — | — | US | disclosed |
| US-9417521-B2 | Photoresist composition and method for forming a metal pattern | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-08-16 | — | — | US | disclosed |
| US-20160233083-A1 | METHOD OF FORMING MICROPATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-08-11 | — | — | US | disclosed |
| US-9366959-B2 | Negative photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2016-06-14 | — | — | US | disclosed |
| US-9343553-B2 | Photoresist composition, method of forming a pattern and method of manufacturing a thin film transistor substrate | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-05-17 | — | — | US | disclosed |
| US-9337032-B2 | Method of forming pattern of semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-05-10 | — | — | US | disclosed |
| US-9316907-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-04-19 | — | — | US | disclosed |
| US-9285681-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-03-15 | — | — | US | disclosed |
| EP-2182405-B1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | JSR CORP (JP) | 2016-01-13 | — | — | EP | disclosed |
| US-20150378256-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE SAME | CHI MEI CORPORATION (TW) | 2015-12-31 | — | — | US | disclosed |
| US-20150376355-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE SAME | CHI MEI CORPORATION (TW) | 2015-12-31 | — | — | US | disclosed |
| US-9169409-B2 | Ink composition for imprint lithography and roll printing | LG DISPLAY CO., LTD. (KR) | 2015-10-27 | — | — | US | disclosed |
| US-20150241774-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-08-27 | — | — | US | disclosed |
| US-9102663-B2 | Method for producing epoxy compound having cyanuric acid skeleton | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150212411-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-07-30 | — | — | US | disclosed |
| US-20150205200-A1 | PHOTORESIST COMPOSITION, METHOD OF FORMING A PATTERN AND METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-07-23 | — | — | US | disclosed |
| US-20150133582-A1 | INK COMPOSITION FOR IMPRINT LITHOGRAPHY AND ROLL PRINTING | LG DISPLAY CO., LTD. (KR) | 2015-05-14 | — | — | US | disclosed |
| US-20150118852-A1 | METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-04-30 | — | — | US | disclosed |
| US-8980506-B2 | Photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2015-03-17 | — | — | US | disclosed |
| US-20150044790-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2015-02-12 | — | — | US | disclosed |
| US-20150031808-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-01-29 | — | — | US | disclosed |
| US-8911926-B2 | Photoresist composition and method of forming a metal pattern using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-12-16 | — | — | US | disclosed |
| US-20140356786-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-12-04 | — | — | US | disclosed |
| US-8883377-B2 | Photoresist composition for forming a color filter and method of manufacturing a substrate for a display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-11-11 | — | — | US | disclosed |
| US-20140255845-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-09-11 | — | — | US | disclosed |
| US-20140240645-A1 | PHOTOSENSITIVE RESIN COMPOSITION, DISPLAY DEVICE USING THE SAME AND METHOD OF MANUFACTURING THE DISPLAY DEVICE | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-08-28 | — | — | US | disclosed |
| US-8808963-B2 | Photoresist composition and method of manufacturing array substrate using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-08-19 | — | — | US | disclosed |
| US-8778597-B2 | Long-chain alkylene-containing curable epoxy resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20140183162-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FORMING A METAL PATTERN | SAMSUNG DISPLAY CO., LTD (KR) | 2014-07-03 | — | — | US | disclosed |
| US-8765835-B2 | Epdxy resin composition having monocyclic aliphatic hydrocarbon ring | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8722755-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2014-05-13 | — | — | US | disclosed |
| US-8722311-B2 | Positive resist composition and method for producing microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20140076847-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A METAL PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-03-20 | — | — | US | disclosed |
| US-20140051017-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2014-02-20 | — | — | US | disclosed |
| US-20130295495-A1 | PHOTORESIST COMPOSITION FOR FORMING A COLOR FILTER AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE | SAMSUNG DISPLAY CO., LTD. (KR) | 2013-11-07 | — | — | US | disclosed |
| US-8563214-B2 | Radiation sensitive resin composition and method of forming an interlayer insulating film | SHARP CORPORATION (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130274433-A1 | POLYFUNCTIONAL EPOXY COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-17 | — | — | US | disclosed |
| EP-2641926-A1 | POLYFUNCTIONAL EPOXY COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-20130245150-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | disclosed |
| US-20130177849-A1 | EPOXY RESIN COMPOSITION HAVING MONOCYCLIC ALIPHATIC HYDROCARBON RING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20130172525-A1 | METHOD FOR PRODUCING EPOXY COMPOUND HAVING CYANURIC ACID SKELETON | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130172522-A1 | EPOXY COMPOUND WITH NITROGEN-CONTAINING RING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| EP-2602274-A1 | EPOXY RESIN COMPOSITION HAVING MONOCYCLIC ALIPHATIC HYDROCARBON RING | Nissan Chemical Industries, Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| EP-2602257-A1 | EPOXY COMPOUND WITH NITROGEN-CONTAINING RING | Nissan Chemical Industries, Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| EP-2602256-A1 | METHOD FOR PRODUCING EPOXY COMPOUND HAVING CYANURIC ACID SKELETON | Nissan Chemical Industries, Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8409783-B2 | Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-02 | — | — | US | disclosed |
| US-8399068-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2013-03-19 | — | — | US | disclosed |
| US-20130048604-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME | AZ ELECTRONIC MATERIALS (KOREA), LTD. (KR) | 2013-02-28 | — | — | US | disclosed |
| EP-2530098-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530524-A1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120295199-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120270151-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING AN INTERLAYER INSULATING FILM | JSR CORPORATION (JP) | 2012-10-25 | — | — | US | disclosed |
| US-20120270142-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-25 | — | — | US | disclosed |
| US-8257905-B2 | Method of fabricating thin film transistor substrate and negative photoresist composition used therein | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-09-04 | — | — | US | disclosed |
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | disclosed |
| US-8173729-B2 | Photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-05-08 | — | — | US | disclosed |
| US-20120064463-A1 | Method of Forming Micropatterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-03-15 | — | — | US | disclosed |
| US-20120064455-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG TECHWIN CO., LTD. (KR) | 2012-03-15 | — | — | US | disclosed |
| US-20110294243-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-12-01 | — | — | US | disclosed |
| US-20110224335-A1 | INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | KIM SUNG-HEE | 2011-09-15 | — | — | US | disclosed |
| US-7989136-B2 | Photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-02 | — | — | US | disclosed |
| US-20110171581-A1 | PHOTORESIST COMPOSTION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-07-14 | — | — | US | disclosed |
| US-20110118422-A1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD OF PRODUCING A LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE | JSR CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| US-7935552-B2 | Ink composition and method of fabricating liquid crystal display device using the same | LG DISPLAY CO., LTD. (KR) | 2011-05-03 | — | — | US | disclosed |
| US-7927897-B2 | Photoresist composition and method of manufacturing array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-19 | — | — | US | disclosed |
| US-20110068301-A1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD OF PRODUCING A LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE | JSR CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7879961-B2 | Resin composition for organic insulating layer, method of manufacturing resin composition, and display panel including resin composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-02-01 | — | — | US | disclosed |
| US-7811726-B2 | Photoresist composition and method of manufacturing a color filter substrate by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-10-12 | — | — | US | disclosed |
| US-7799509-B2 | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-21 | — | — | US | disclosed |
| US-20100222473-A1 | PHOTOSENSITIVE RESIN COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2010-09-02 | — | — | US | disclosed |
| US-20100209847-A1 | COPOLYMER, RESIN COMPOSITION, SPACER FOR DISPLAY PANEL, PLANARIZATION FILM, THERMOSETTING PROTECTIVE FILM, MICROLENS, AND PROCESS FOR PRODUCING COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20100203449-A1 | METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND NEGATIVE PHOTORESIST COMPOSITION USED THEREIN | SAMSUNG DISPLAY CO., LTD. (KR) | 2010-08-12 | — | — | US | disclosed |
| US-20100167206-A1 | PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE USING THE PHOTORESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-07-01 | — | — | US | disclosed |
| US-20100120181-A1 | INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | LG DISPLAY CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |
| US-7713680-B2 | Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device | JSR CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| EP-2182405-A1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | JSR Corporation (JP) | 2010-05-05 | — | — | EP | disclosed |
| EP-2182407-A1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | JSR Corporation (JP) | 2010-05-05 | — | — | EP | disclosed |
| US-7691915-B2 | Photosensitive resin composition for forming organic insulating film and device using the same | CHEIL INDUSTRIES INC. (KR) | 2010-04-06 | — | — | US | disclosed |
| US-20100021832-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A COLOR FILTER SUBSTRATE BY USING THE SAME | TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2010-01-28 | — | — | US | disclosed |
| US-20100016486-A1 | TWO-COMPONENT HARDENING COMPOSITION | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-1475665-B1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7638253-B2 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-12-29 | — | — | US | disclosed |
| EP-1655346-B1 | TWO-PART CURABLE COMPOSITION | SUNSTAR ENGINEERING INC (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-7622525-B2 | Two-part curable composition | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2009-11-24 | — | — | US | disclosed |
| EP-2119744-A1 | TWO-COMPONENT HARDENING COMPOSITION | Sunstar Giken Kabushiki Kaisha (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-7615322-B2 | Photoresist composition and method of manufacturing a color filter substrate by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-10 | — | — | US | disclosed |
| US-7595143-B2 | Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-29 | — | — | US | disclosed |
| US-20090227058-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-10 | — | — | US | disclosed |
| US-20090215233-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-08-27 | — | — | US | disclosed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | disclosed |
| US-20090169736-A1 | THERMOSETTING RESIN COMPOSITION, METHOD OF FORMING ANTIHALATION FILM OF SOLID-STATE IMAGING DEVICE, ANTIHALATION FILM FOR SOLID-STATE IMAGING DEVICES, AND SOLID-STATE IMAGING DEVICE | JSR CORPORATION (JP) | 2009-07-02 | — | — | US | disclosed |
| US-20090042127-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-12 | — | — | US | disclosed |
| US-20080254634-A1 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2008-10-16 | — | — | US | disclosed |
| US-20080233515-A1 | RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE | JSR CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| EP-1972673-A1 | Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device | JSR Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |
| US-20080145786-A1 | Photosensitive Resin Composition for Forming Organic Insulating Film and Device Using the Same | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| US-7378224-B2 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20080044766-A1 | a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; exposing to light, developing | SAMSUNG ELECTRONICS CO., LTD. | 2008-02-21 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20070184293-A1 | RESIN COMPOSITION FOR ORGANIC INSULATING LAYER, METHOD OF MANUFACTURING RESIN COMPOSITION, AND DISPLAY PANEL INCLUDING RESIN COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-09 | — | — | US | disclosed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20070048662-A1 | Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists | SAMSUNG ELECTRONICS CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20060293437-A1 | Two-part curable composition | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060275700-A1 | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-12-07 | — | — | US | disclosed |
| US-7125647-B2 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| US-20060210929-A1 | Photosensitive composition and forming process of structured material using the composition | CANON KABUSHIKI KAISHA (JP) | 2006-09-21 | — | — | US | disclosed |
| US-7108954-B2 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20060177767-A1 | Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| US-7071255-B2 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2006-07-04 | — | — | US | disclosed |
| EP-1655346-A1 | TWO-PART CURABLE COMPOSITION | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2006-05-10 | — | — | EP | disclosed |
| US-6994944-B2 | Radiation sensitive resin composition, cathode separator and EL display device | JSR CORPORATION (JP) | 2006-02-07 | — | — | US | disclosed |
| US-6984476-B2 | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device | SHARP KABUSHIKI KAISHA (JP) | 2006-01-10 | — | — | US | disclosed |
| US-20050260526-A1 | Radiation sensitive resin composition, cathode separator and EL display device | JSR CORPORATION (JP) | 2005-11-24 | — | — | US | disclosed |
| US-6929890-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2005-08-16 | — | — | US | disclosed |
| US-20050014100-A1 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1498776-A2 | Method for forming pattern, and optical element | JSR Corporation (JP) | 2005-01-19 | — | — | EP | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| EP-1475665-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040197703-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-10-07 | — | — | US | disclosed |
| US-6797450-B2 | ALKALI-SOLUBLE RESIN HAVING NO EPOXY GROUP AND A 1,2-QUINONEDIAZIDE COMPOUND | JSR CORPORATION (JP) | 2004-09-28 | — | — | US | disclosed |
| US-6797453-B2 | WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS | JSR CORPORATION (JP) | 2004-09-28 | — | — | US | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-6756165-B2 | ALKALI SOLUBLE RESIN, UNSATURATED POLYMERIZABLE COMPOUND, RADIATION SENSITIVE POLYMERIZATION INITIATOR | JSR CORPORATION (JP) | 2004-06-29 | — | — | US | disclosed |
| EP-1057859-B1 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR CORP (JP) | 2004-05-19 | — | — | EP | disclosed |
| EP-1413924-A1 | COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN | JSR Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| US-20040005506-A1 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1369459-A1 | RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION | JSR Corporation (JP) | 2003-12-10 | — | — | EP | disclosed |
| US-20030215737-A1 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR CORPORATION (JP) | 2003-11-20 | — | — | US | disclosed |
| US-20030193624-A1 | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device | SHARP KABUSHIKI KAISHA (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030187119-A1 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| EP-1312982-A1 | RADIATION-SENSITIVE COMPOSITION, INSULATING FILM AND ORGANIC EL DISPLAY ELEMENT | JSR Corporation (JP) | 2003-05-21 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| US-20030054284-A1 | Radiation-sensitive composition, insulating film and organic el display element | JSR CORPORATION (JP) | 2003-03-20 | — | — | US | disclosed |
| US-6491729-B1 | Dry-cleaning solvent composition | Lee, Chin Yen (TW) | 2002-12-10 | — | — | US | disclosed |
| US-6491729-B1 | Dry-cleaning solvent composition | Lee, Chin Yen (TW) | 2002-12-10 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-6399267-B1 | COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER | JSR CORPORATION (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20020055059-A1 | Radiation sensitive resin composition, cathode separator and el display device | JSR CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130172525-A1 | METHOD FOR PRODUCING EPOXY COMPOUND HAVING CYANURIC ACID SKELETON | C9, EPX, C5 | PRKCA 1089/4885NAAA 1782/4885PRKCE 1206/4885 |
| US-20130172522-A1 | EPOXY COMPOUND WITH NITROGEN-CONTAINING RING | C5, EPB41, H1-4 | PRKCA 4152/4885NAAA 1599/4885PRKCE 3351/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.