SCHEMBL4453375

SCHEMBL4453375

C=C(CC(O)Cc1ccccc1)C(=O)O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.57
TRPV1 Q8NER1 1/20 0.50
CYP1A2 P05177 1/20 0.47
CPA1 P15085 2/20 0.46
CPA3 P15088 2/20 0.46
CPB1 P15086 1/20 0.46
CPB2 Q96IY4 1/20 0.46
SRR Q9GZT4 2/20 0.44
EPHX1 P07099 1/20 0.44
ALPI P09923 1/20 0.44
PKM P14618 1/20 0.44
PTGS1 P23219 1/20 0.44
XIAP P98170 1/20 0.44
SLC7A5 Q01650 1/20 0.44
TET2 Q6N021 3/20 0.44
TET3 O43151 1/20 0.44
TET1 Q8NFU7 1/20 0.44
ALPL P05186 1/20 0.43
POLB P06746 1/20 0.43
ALPG P10696 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28099819 0.82 TRPA1 (0.50) TRPA1TRPV1CYP1A2CPA1SRR
SCHEMBL7575673 0.80 TRPA1 (0.76) TRPA1TRPV1CYP1A2CPA1CPA3
SCHEMBL6138407 0.80 TRPA1 (0.65) TRPA1TRPV1CYP1A2CPA1CPA3
SCHEMBL1861755 0.80 TRPA1 (0.65) TRPA1TRPV1CYP1A2CPA1CPA3
SCHEMBL10535065 0.80 TRPA1 (0.65) TRPA1TRPV1CYP1A2CPA1CPA3
SCHEMBL5437590 0.80 NPC1 (0.47) TRPA1CYP1A2CPA1CPA3CPB1
SCHEMBL1334237 0.79 MTNR1A (0.51) TRPA1CYP1A2CPA1CPA3CPB1
SCHEMBL7520962 0.77 KMT2A (0.57) TRPA1CPA1TET2TET3TET1
SCHEMBL28977372 0.77 TRPA1 (0.61) TRPA1TRPV1CYP1A2CPA1CPA3
SCHEMBL9014437 0.77 TRPA1 (0.51) TRPA1TRPV1CYP1A2CPA1CPA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8211613-B2 prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure DAI NIPPON PRINTING CO., LTD. (JP) 2012-07-03 US disclosed
US-7528205-B2 Photo radical generator, photo sensitive resin composition and article DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-05 US disclosed
US-20080275154-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition SAKAYORI KATSUYA 2008-11-06 US disclosed
US-7410746-B2 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2008-08-12 US disclosed
US-20050119432-A1 Photo radical generator, photo sensitive resin composition and article DAI NIPPON PRINTING CO., LTD. (JP) 2005-06-02 US disclosed
US-20040023159-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2004-02-05 US disclosed
EP-0587280-B1 Antiferroelectric liquid crystal composite material, process for preparing the same, and liquid crystal element using the same MITSUI PETROCHEMICAL IND (JP) 1997-02-26 EP disclosed
US-5389287-A Blend with polymer MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-02-14 US disclosed
EP-0587280-A1 Antiferroelectric liquid crystal composite material, process for preparing the same, and liquid crystal element using the same MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-03-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050119432-A1 Photo radical generator, photo sensitive resin composition and article RRS1, HEATR1, PSMC6 TRPA1 641/4885TRPV1 592/4885CYP1A2 619/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.