SCHEMBL4454491

SCHEMBL4454491

C=C(C#N)c1ccc(O)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.52
HTT P42858 2/20 0.52
HSD17B10 Q99714 2/20 0.52
GFER P55789 1/20 0.52
GPR55 Q9Y2T6 1/20 0.52
ESR1 P03372 4/20 0.47
ESR2 Q92731 4/20 0.47
CA12 O43570 3/20 0.44
CA2 P00918 3/20 0.44
CA3 P07451 3/20 0.44
CA9 Q16790 3/20 0.44
CA14 Q9ULX7 3/20 0.44
CA6 P23280 2/20 0.44
NQO2 P16083 1/20 0.42
CYP19A1 P11511 2/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
THRB P10828 1/20 0.41
CISD1 Q9NZ45 1/20 0.41
LMNA P02545 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1931317 0.79 ESR1 (0.50) MAPTHTTHSD17B10GFERGPR55
SCHEMBL1931315 0.79 ESR1 (0.50) MAPTHTTHSD17B10GFERGPR55
SCHEMBL2979315 0.78 CES2 (0.42) MAPTHTTCA2MEN1KMT2A
SCHEMBL28122546 0.78 RECQL (0.45) MAPTCA2MEN1KMT2ALMNA
SCHEMBL1055481 0.78 ALDH1A1 (0.42) MAPTHTTHSD17B10MEN1KMT2A
SCHEMBL28231639 0.78 MASP2 (0.41) MAPTHSD17B10ESR1ESR2CA3
SCHEMBL1094452 0.78 CES2 (0.42) CA2MEN1KMT2ALMNACA1
SCHEMBL11362763 0.78 CA2 (0.50) MAPTCA12CA2CA3CA9
SCHEMBL20882112 0.78 TDP1 (0.39) MAPTMEN1KMT2ALMNANPC1
SCHEMBL330617 0.77 ALDH1A1 (0.42) MAPTMEN1KMT2ALMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117586621-A Silicon chain-containing acrylic liquid crystal photosensitive resin composition and application thereof in 3D printing 泉州师范学院 2024-02-23 CN claimed
CN-113831461-B Bismaleimide/acrylic acid liquid crystal photosensitive resin-based composition and application thereof in 405nm3D printing 泉州师范学院 2023-11-21 CN claimed
CN-113736217-B Composition based on liquid crystal epoxy photosensitive resin and application of composition in 355nm3D printing 泉州师范学院 2023-11-07 CN claimed
CN-113651920-B Acrylic liquid crystal photosensitive resin-based composition and application thereof in 405nm3D printing 泉州师范学院 2023-06-06 CN claimed
CN-116003739-A Silicon chain-containing acrylic acid liquid crystal photosensitive resin and preparation method thereof 泉州师范学院 2023-04-25 CN claimed
CN-113831461-A Bismaleimide/acrylic acid liquid crystal photosensitive resin-based composition and application thereof in 405nm3D printing 泉州师范学院 2021-12-24 CN claimed
CN-113788931-A Acrylic liquid crystal photosensitive resin and preparation method thereof 泉州师范学院 2021-12-14 CN claimed
CN-113735801-A Liquid crystal epoxy photosensitive resin and preparation method thereof 泉州师范学院 2021-12-03 CN claimed
CN-113736217-A Composition based on liquid crystal epoxy photosensitive resin and application of composition in 355nm3D printing 泉州师范学院 2021-12-03 CN claimed
CN-113651920-A Composition based on acrylic liquid crystal photosensitive resin and application thereof in 405nm 3D printing 泉州师范学院 2021-11-16 CN claimed
CN-107011213-A Luminous fluorescence probe of a kind of multichannel and its preparation method and application 复旦大学 2017-08-04 CN claimed
US-7586013-B2 Method for preparing hydroxystyrenes and acetylated derivatives thereof E.I. DU PONT DE NEMOURS AND COMPANY (US) 2009-09-08 US claimed
US-20070299276-A1 Preparation of fluoroalkoxystyrenes E. I. DU PONT DE NEMOURS AND COMPANY 2007-12-27 US claimed
WO-2007149449-A2 PREPARATION OF FLUOROALKOXYSTYRENES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-12-27 WO claimed
US-20050228191-A1 Method for preparing hydroxystyrenes and acetylated derivatives thereof E. I. DU PONT DE NEMOURS AND COMPANY 2005-10-13 US claimed
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
EP-0750498-A1 USE OF ANTAGONISTS OF EGF OR TGF-ALPHA FOR THE TREATMENT AND PROPHYLAXIS OF ACNE UNILEVER PLC (GB) 1997-01-02 EP disclosed
WO-1995024896-A2 USE OF ANTAGONISTS OF EGF OR TGF-ALPHA FOR THE TREATMENT AND PROPHYLAXIS OF ACNE UNILEVER PLC (GB) 1995-09-21 WO disclosed
EP-0399350-A2 Curable compositions THE DOW CHEMICAL COMPANY (US) 1990-11-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070299276-A1 Preparation of fluoroalkoxystyrenes LSS, CYP2F1, PFAS MAPT 3837/4885HTT 817/4885HSD17B10 318/4885
US-20050228191-A1 Method for preparing hydroxystyrenes and acetylated derivatives thereof HAAO, EP300, HACL2 MAPT 1940/4885HTT 347/4885HSD17B10 96/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.