SCHEMBL4454952

SCHEMBL4454952

COS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
F2 P00734 4/20 0.46
PRSS1 P07477 4/20 0.46
PRSS2 P07478 4/20 0.46
PRSS3 P35030 4/20 0.46
CA2 P00918 15/20 0.44
CA1 P00915 14/20 0.43
MMP1 P03956 6/20 0.43
MMP2 P08253 6/20 0.43
MMP9 P14780 6/20 0.43
MMP8 P22894 6/20 0.43
MMP13 P45452 6/20 0.43
USP2 O75604 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27991564 0.98 CA2 (0.48) F2PRSS1PRSS2PRSS3CA2
SCHEMBL8406248 0.92 F2 (0.38) F2PRSS1PRSS2PRSS3CA2
SCHEMBL781139 0.87 USP2 (0.35) F2PRSS1PRSS2PRSS3CA2
SCHEMBL1697233 0.83 F2 (0.32) F2PRSS1PRSS2PRSS3
SCHEMBL4297517 0.81 USP2 (0.35) F2PRSS1PRSS2PRSS3CA2
SCHEMBL167861 0.79 CA2 (0.48) F2PRSS1PRSS2PRSS3CA2
SCHEMBL1146256 0.77 CA2 (0.52) F2PRSS1PRSS2PRSS3CA2
SCHEMBL11802495 0.77 CA2 (0.52) F2PRSS1PRSS2PRSS3CA2
SCHEMBL8437170 0.77 CA2 (0.52) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6396150 0.77 CA2 (0.52) F2PRSS1PRSS2PRSS3CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114315531-A Photosensitizer with high photosensitive activity and preparation method thereof 宁波南大光电材料有限公司 2022-04-12 CN claimed
JP-58216166-A None JP disclosed
CN-118363270-A Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2024-07-19 CN disclosed
EP-4263646-A1 STABILIZED EPOXY-ISOCYANATE MIXTURES AND OXAZOLIDINONE CONTAINING POLYMERS OBTAINED THEREFROM BASF SE (DE) 2023-10-25 EP disclosed
US-20230173078-A1 SMARCA DEGRADERS AND USES THEREOF KYMERA THERAPEUTICS, INC. 2023-06-08 US disclosed
CN-110088680-B Double-layer photosensitive layer roll 旭化成株式会社 2022-12-30 CN disclosed
WO-2022136048-A1 STABILIZED EPOXY-ISOCYANATE MIXTURES AND OXAZOLIDINONE CONTAINING POLYMERS OBTAINED THEREFROM BASF SE (DE) 2022-06-30 WO disclosed
CN-114315531-A Photosensitizer with high photosensitive activity and preparation method thereof 宁波南大光电材料有限公司 2022-04-12 CN disclosed
CN-112585536-A Photosensitive resin composition, dry film, cured product, and electronic component 太阳控股株式会社 2021-03-30 CN disclosed
CN-107329367-B Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device 旭化成株式会社 2021-03-23 CN disclosed
US-6528232-B1 Chemically amplified photoresist composition using the novel sulfonium salt compound as the photoacid generator NEC CORPORATION (JP) 2003-03-04 US disclosed
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method NEC CORPORATION (JP) 2002-12-05 US disclosed
EP-0898556-B1 A PROCESS FOR THE PRODUCTION OF HYDROFLUOROETHERS MINNESOTA MINING & MFG (US) 2001-12-12 EP disclosed
EP-0898556-A1 A PROCESS FOR THE PRODUCTION OF HYDROFLUOROETHERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1999-03-03 EP disclosed
US-5750797-A CONTACTING A FLUORINATED CARBONYL-CONTAINING COMPOUND WITH AN ALKYLATING AGENT IN THE PRESENCE OF AN ANHYDROUS SOURCE OF FLUORIDE ION AND A TERTIARY AMINE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-05-12 US disclosed
WO-1997038962-A1 A PROCESS FOR THE PRODUCTION OF HYDROFLUOROETHERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-10-23 WO disclosed
US-5470523-A Process of molding products by rim BAYER AKTIENGESELLSCHAFT (DE) 1995-11-28 US disclosed
US-5173559-A Polyisocyanate, stabilized epoxide, isocyanate-reactive group, polyisocyanurates; pot life BAYER AKTIENGESELLSCHAFT (DE) 1992-12-22 US disclosed
US-5021536-A Curable mixtures of polyisocyanates, epoxides, alyklating agent to inhibit polymerization BAYER AKTIENGESELLSCHAFT (DE) 1991-06-04 US disclosed
JP-S58216166-A PRODUCTION OF N-SUBSTITUTED IMIDAZOLE KYOWA HAKKO KOGYO CO LTD 1983-12-15 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230173078-A1 SMARCA DEGRADERS AND USES THEREOF SMARCA1, SMARCA2, SMARCC2 F2 4344/4885PRSS1 1439/4885PRSS2 1898/4885
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method ASIC1, ASIC3, SULT1A1 F2 3437/4885PRSS1 854/4885PRSS2 543/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.