SCHEMBL4455166

SCHEMBL4455166

CC(C)c1cc(CO)c(O)c(CO)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.45
GABRB2 P47870 2/20 0.45
CYP1A2 P05177 2/20 0.44
CYP2D6 P10635 2/20 0.44
SHBG P04278 1/20 0.42
KDM4E B2RXH2 2/20 0.39
CASP6 P55212 1/20 0.39
FABP3 P05413 2/20 0.38
FABP4 P15090 2/20 0.38
FABP5 Q01469 1/20 0.38
RNASEH1 O60930 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
TRPA1 O75762 1/20 0.35
PTGS1 P23219 1/20 0.35
CACNA1C Q13936 1/20 0.35
ADRB2 P07550 2/20 0.35
HIF1A Q16665 2/20 0.35
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8347004 0.87 SHBG (0.55) GABRA1GABRB2CYP1A2CYP2D6SHBG
SCHEMBL2620963 0.82 PDE4A (0.44) CYP1A2CYP2D6KDM4ETSHRNFKB1
SCHEMBL27536560 0.82 SHBG (0.39) GABRA1GABRB2CYP1A2CYP2D6SHBG
SCHEMBL16865574 0.82 SHBG (0.39) GABRA1GABRB2CYP1A2CYP2D6SHBG
SCHEMBL16592924 0.81 FABP3 (0.38) GABRA1GABRB2CYP1A2CYP2D6FABP3
SCHEMBL12893845 0.81 GABRA1 (0.41) GABRA1GABRB2CYP1A2CYP2D6KDM4E
SCHEMBL16597203 0.81 FABP3 (0.38) GABRA1GABRB2CYP1A2CYP2D6SHBG
SCHEMBL31337454 0.81 GABRA1 (0.46) GABRA1GABRB2CYP1A2CYP2D6KDM4E
SCHEMBL4459305 0.80 ALDH1A1 (0.43) GABRA1GABRB2CYP1A2CYP2D6SHBG
SCHEMBL3081907 0.80 KDM4E (0.41) GABRA1GABRB2CYP1A2CYP2D6SHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116819891-A Alkali-soluble resin polymer, preparation method thereof and positive photosensitive resin composition 徐州博康信息化学品有限公司 2023-09-29 CN disclosed
WO-2020184629-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT USING SAME 日産化学株式会社 2020-09-17 WO disclosed
US-7586009-B2 Bis-(hydroxybenzaldehyde) compound and novel polynuclear polyphenol compound derived therefrom and method for production thereof HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2009-09-08 US disclosed
US-20090076310-A1 NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2009-03-19 US disclosed
CN-100446990-C Color developing agent for recording material ASAHI CHEMICAL CORP (JP) 2008-12-31 CN disclosed
US-20070099130-A1 Developer for recording materials CHEMIPRO KASEI KAISHA, LTD. (JP) 2007-05-03 US disclosed
CN-1812887-A Developer for recording materials ASAHI CHEMICAL CORP (JP) 2006-08-02 CN disclosed
EP-1637337-A1 DEVELOPER FOR RECORDING MATERIALS Asahi Kasei Chemicals Corporation (JP) 2006-03-22 EP disclosed
EP-0906352-B1 NOVOLAK COMPOUNDS USEFUL AS ADHESION PROMOTERS FOR EPOXY RESINS MINNESOTA MINING & MFG (US) 2000-08-23 EP disclosed
EP-0906352-A1 NOVOLAK COMPOUNDS USEFUL AS ADHESION PROMOTERS FOR EPOXY RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1999-04-07 EP disclosed
US-5859153-A Novolak compounds useful as adhesion promoters for epoxy resins MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1999-01-12 US disclosed
WO-1997048746-A1 NOVOLAK COMPOUNDS USEFUL AS ADHESION PROMOTERS FOR EPOXY RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-12-24 WO disclosed
EP-0032062-B2 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1991-10-16 EP disclosed
EP-0032062-B1 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-04-03 EP disclosed
US-4345054-A High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1982-08-17 US disclosed
EP-0032062-A2 High-molecular-weight novolak substituted phenolic resins and their preparation MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1981-07-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090076310-A1 NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF DDT, PAH, HPD GABRA1 464/4885GABRB2 228/4885CYP1A2 1333/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.