Fluorene

Fluorene

SCHEMBL445897

Oc1ccc(-c2ccc(O)cc2)cc1.c1ccc2c(c1)Cc1ccccc1-2

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 0.54
BCL2L1 Q07817 1/20 0.54
CHEK1 O14757 1/20 0.54
ESR1 P03372 5/20 0.50
ESR2 Q92731 4/20 0.50
ABL1 P00519 1/20 0.48
ABCB1 P08183 1/20 0.48
BCR P11274 1/20 0.48
MAOA P21397 1/20 0.48
MIF P14174 1/20 0.47
LMNA P02545 2/20 0.45
MAPT P10636 2/20 0.45
RAB9A P51151 2/20 0.45
KDM4E B2RXH2 1/20 0.45
NPC1 O15118 1/20 0.45
ALDH1A1 P00352 1/20 0.45
HPGD P15428 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluorene SCHEMBL29255665 0.96 MMP3 (0.62) MMP3BCL2L1CHEK1ESR1ESR2
Fluorene SCHEMBL9397891 0.93 MAOA (0.54) CHEK1ABL1ABCB1BCRMAOA
SCHEMBL28217038 0.90 TDP2 (0.54) MMP3BCL2L1CHEK1ESR1ESR2
SCHEMBL28023619 0.90 KDM4E (0.52) CHEK1ESR1ESR2ABL1ABCB1
Fluorene SCHEMBL28777378 0.86 CA12 (0.55) CHEK1MAOAMIFLMNAMAPT
Fluorene SCHEMBL29204380 0.86 CA12 (0.55) CHEK1MAOAMIFLMNAMAPT
Fluorene SCHEMBL441983 0.86 CA12 (0.55) CHEK1MAOAMIFLMNAMAPT
Fluorene SCHEMBL233215 0.86 CA12 (0.55) CHEK1MAOAMIFLMNAMAPT
Fluorene SCHEMBL28881902 0.84 CA12 (0.52) CHEK1MAOAMIFLMNAMAPT
Fluorene SCHEMBL28949262 0.84 BCL2L1 (0.46) MMP3BCL2L1CHEK1ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114127038-A Process for isomerizing products obtained from the condensation of ketones and phenols to produce bisphenols PTT全球化学公共有限公司 2022-03-01 CN disclosed
US-9045587-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-20140363768-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-8846846-B2 Naphthalene derivative, resist bottom layer material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20120064725-A1 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-15 US disclosed