SCHEMBL446240

SCHEMBL446240

CCC(C)OOC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL7530022 0.95 TSHR (0.34)
SCHEMBL1551772 0.82 ALDH1A1 (0.33)
SCHEMBL442955 0.81 CHRM1 (0.36)
SCHEMBL356089 0.78 ALDH1A1 (0.33)
SCHEMBL5517805 0.78 TSHR (0.36)
SCHEMBL6465835 0.78
SCHEMBL28632969 0.78 MAPT (0.31)
SCHEMBL6824214 0.78 MAPT (0.31)
SCHEMBL448883 0.78 FAAH (0.42)
SCHEMBL29053697 0.78 MGAM (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6992133-B2 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins CPH INNOVATIONS CORP. (US) 2006-01-31 US claimed
US-20040171755-A1 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT 2004-09-02 US claimed
EP-1268691-A1 LOW VOC, NONLINEAR POLYESTER POLYOL RESIN-BASED COMPOSITIONS The C.P. Hall Company (US) 2003-01-02 EP claimed
US-20010036999-A1 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins CPH INNOVATIONS CORP. 2001-11-01 US claimed
WO-2001059020-A1 LOW VOC, NONLINEAR POLYESTER POLYOL RESIN-BASED COMPOSITIONS THE C.P. HALL COMPANY (US) 2001-08-16 WO claimed
US-20250189895-A1 METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-06-12 US disclosed
US-20250172872-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-29 US disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
US-11773266-B2 Polymer, molded body, foam, resin composition, and production method for polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-03 US disclosed
US-20230273521-A1 CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-31 US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
US-20230129965-A1 HYDROPHILIC AND OLEOPHOBIC POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-04-27 US disclosed
US-6992133-B2 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins CPH INNOVATIONS CORP. (US) 2006-01-31 US disclosed
US-20050043452-A1 Colorant-containing curable composition, color filter and method of producing the same FUJI PHOTO FILM CO., LTD. 2005-02-24 US disclosed
US-20040171755-A1 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT 2004-09-02 US disclosed
US-20040009414-A1 Dye-containing curable composition, color filter and method of manufacturing the same FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
EP-1268691-A1 LOW VOC, NONLINEAR POLYESTER POLYOL RESIN-BASED COMPOSITIONS The C.P. Hall Company (US) 2003-01-02 EP disclosed
US-20010036999-A1 Low VOC, coating compositions having improved flexibility and impact resistance based upon nonlinear, low-molecular weight polyester polyol resins CPH INNOVATIONS CORP. 2001-11-01 US disclosed
WO-2001059020-A1 LOW VOC, NONLINEAR POLYESTER POLYOL RESIN-BASED COMPOSITIONS THE C.P. HALL COMPANY (US) 2001-08-16 WO disclosed
US-6140016-A LIGHT SENSITIVE ELEMENTS AND COLOR FILTERS FUJI PHOTO FILM CO. LTD. (JP) 2000-10-31 US disclosed