SCHEMBL448883

SCHEMBL448883

CCCCC(C)OOC(C)=O

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
FAAH O00519 5/20 0.42
ALDH1A1 P00352 1/20 0.40
CA2 P00918 6/20 0.38
CA1 P00915 4/20 0.38
CNR1 P21554 1/20 0.38
CNR2 P34972 1/20 0.38
MAPK1 P28482 1/20 0.38
SLC15A1 P46059 1/20 0.35
FDPS P14324 1/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL442955 0.87 CHRM1 (0.36) FAAHALDH1A1CA1FDPSLMNA
SCHEMBL5574687 0.81 TSHR (0.44) FAAHALDH1A1CA2CA1CNR1
SCHEMBL12486172 0.80 ALDH1A1 (0.41) FAAHALDH1A1CA2CA1CNR1
SCHEMBL5575258 0.79 TSHR (0.51) FAAHALDH1A1CA2CA1CNR1
SCHEMBL28226286 0.79 LMNA (0.52) FAAHALDH1A1CNR1CNR2MAPK1
SCHEMBL181003 0.78 FAAH (0.53) FAAHALDH1A1CA2CA1CNR1
SCHEMBL446240 0.78
SCHEMBL445105 0.78 CA2 (0.41) ALDH1A1CA2CA1MAPK1
SCHEMBL445107 0.78 CTSK (0.40) ALDH1A1CA2CA1MAPK1FDPS
SCHEMBL27523788 0.77 ALDH1A1 (0.44) FAAHALDH1A1CA2CA1CNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10916437-B2 Methods of forming micropatterns and substrate processing apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-02-09 US disclosed
US-20190198342-A1 Methods of Forming Micropatterns and Substrate Processing Apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-27 US disclosed
US-10134606-B2 Method of forming patterns and method of manufacturing integrated circuit device using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-11-20 US disclosed
US-9773672-B2 Method of forming micropatterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-09-26 US disclosed
US-20160233083-A1 METHOD OF FORMING MICROPATTERNS SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-08-11 US disclosed
US-20150340246-A1 METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-26 US disclosed
US-8986554-B2 Method of forming patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-03-24 US disclosed
US-20130295772-A1 METHOD OF FORMING PATTERNS SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-11-07 US disclosed
US-20120064463-A1 Method of Forming Micropatterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-03-15 US disclosed