Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 2/20 | 0.49 |
| ▸ | MAOB | P27338 | 2/20 | 0.49 |
| ▸ | AR | P10275 | 2/20 | 0.42 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.40 |
| ▸ | XDH | P47989 | 1/20 | 0.38 |
| ▸ | THRA | P10827 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 3/20 | 0.35 |
| ▸ | RAB9A | P51151 | 3/20 | 0.35 |
| ▸ | S100A4 | P26447 | 1/20 | 0.35 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5376886 | 0.94 | MAOA (0.43) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL9241946 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL11483343 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL9243196 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL11223570 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL7281456 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL7272059 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL5376643 | 0.92 | THRA (0.45) | MAOAMAOBARSLC2A1THRA | |
| SCHEMBL2879670 | 0.86 | CA12 (0.47) | MAOAMAOBARSLC2A1MAPT | |
| SCHEMBL5887468 | 0.84 | MAOA (0.62) | MAOAMAOBARSLC2A1XDH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | LG CHEM, LTD. (KR) | 2021-10-19 | — | — | US | claimed |
| CN-107141391-B | Ethylene-polar styrene quasi-random copolymer and preparation method thereof | 中国科学院长春应用化学研究所 | 2020-03-13 | — | — | CN | claimed |
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2020-01-30 | — | — | US | claimed |
| CN-105263969-B | Using metallocene polymerization catalyst preparation polyolefin and the method for copolymer | 埃克森美孚化学专利公司 | 2017-04-05 | — | — | CN | claimed |
| CN-105263969-A | Process of producing polyolefins using metallocene polymerization catalysts and copolymers therefrom | EXXONMOBIL CHEM PATENTS INC | 2016-01-20 | — | — | CN | claimed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754920-B2 | Thermal acid generator and resist composition using same | ADEKA CORPORATION (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| CN-116157739-A | Chemically amplified photosensitive composition, photosensitive dry film, method for producing substrate with plating mold, and method for producing plating molded article | 东京应化工业株式会社 | 2023-05-23 | — | — | CN | disclosed |
| EP-0015512-A1 | Thiazole dispersion dyestuffs | BASF Aktiengesellschaft (DE) | 1980-09-17 | — | — | EP | disclosed |
| US-4207233-A | Azo dyes containing a thiazole component | BASF AKTIENGESELLSCHAFT (DE) | 1980-06-10 | — | — | US | disclosed |
| EP-0011246-A1 | Substituted pyridazines, their use and preparation and medicinal preparations containing them | Byk Gulden Lomberg Chemische Fabrik GmbH (DE) | 1980-05-28 | — | — | EP | disclosed |
| EP-0004288-A2 | Phenoxyalkyl amines, pharmaceutical compositions containing them, and process for their preparation | MERCK PATENT GmbH (DE) | 1979-10-03 | — | — | EP | disclosed |
| US-4120886-A | APHIDICIDES | PPG INDUSTRIES, INC. (US) | 1978-10-17 | — | — | US | disclosed |
| US-4108982-A | DIURETICS, HYPOTENSIVE AGENTS | BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DE) | 1978-08-22 | — | — | US | disclosed |
| US-4093812-A | MICROBIOCIDES, DISINFECTANTS | BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DT) | 1978-06-06 | — | — | US | disclosed |
| US-4088554-A | MONOKETALS OF ESTERS AND AMIDES OF AROMATIC ALPHA, BETA-DIOXOCARBOXYLIC ACID | CIBA-GEIGY CORPORATION (US) | 1978-05-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | ASIC1, PPA1, ATP6AP1 | MAOA 622/4885MAOB 3694/4885AR 4728/4885 |
| US-11754920-B2 | Thermal acid generator and resist composition using same | ACSL1, LRBA, GAR1 | MAOA 2601/4885MAOB 1829/4885AR 359/4885 |
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | ASIC1, PPA1, ATP6AP1 | MAOA 622/4885MAOB 3694/4885AR 4728/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.