SCHEMBL447453

SCHEMBL447453

CO[Si](OC)(OC)C(Cc1ccccc1)C(C)NC(C)N

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 5/20 0.44
TAAR1 Q96RJ0 4/20 0.44
SLC6A2 P23975 2/20 0.44
MAOA P21397 1/20 0.44
SLC6A4 P31645 1/20 0.44
SLC6A3 Q01959 1/20 0.44
CYP2A6 P11509 1/20 0.44
ADORA2A P29274 1/20 0.44
ADORA1 P30542 1/20 0.44
CYP2D6 P10635 1/20 0.42
EPHX1 P07099 1/20 0.39
SLC18A2 Q05940 1/20 0.39
LAP3 P28838 1/20 0.38
ANPEP P15144 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21060584 0.87 SIGMAR1 (0.43) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL21060575 0.85 SIGMAR1 (0.42) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL21060553 0.83 SIGMAR1 (0.40) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL3476725 0.82 CYP2D6 (0.53) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL2719462 0.80 CYP2D6 (0.50) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL339199 0.76 SIGMAR1 (0.47) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL2719458 0.74 ALDH1A1 (0.46) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL2488884 0.73 SLC6A2 (0.52) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL37760 0.73 SIGMAR1 (0.44) SIGMAR1TAAR1SLC6A2MAOASLC6A4
SCHEMBL1730609 0.73 TAAR1 (0.50) SIGMAR1TAAR1SLC6A2MAOASLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4869964-A Oxidation resistant compositions for use with rare earth magnets THE B. F. GOODRICH COMPANY (US) 1989-09-26 US claimed
WO-2025005084-A1 SUBSTRATE LAMINATE 三井化学株式会社 2025-01-02 WO disclosed
WO-2024172044-A1 METHOD FOR MANUFACTURING SUBSTRATE LAYERED BODY, LAYERED BODY, AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-08-22 WO disclosed
WO-2024162446-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME 三井化学株式会社 2024-08-08 WO disclosed
US-11965109-B2 Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device MITSUI CHEMICALS, INC. (JP) 2024-04-23 US disclosed
WO-2024029390-A1 METHOD FOR PRODUCING SUBSTRATE LAMINATE AND SEMICONDUCTOR DEVICE 三井化学株式会社 2024-02-08 WO disclosed
US-20240026219-A1 LIGHT-EMITTING PARTICLES AND METHOD FOR PRODUCING THE SAME, LIGHT-EMITTING PARTICLE DISPERSION, LIGHT CONVERSION FILM, LAMINATE, LIGHT CONVERSION LAYER, COLOR FILTER, AND LIGHT-EMITTING ELEMENT DIC CORPORATION (JP) 2024-01-25 US disclosed
WO-2024010007-A1 SUBSTRATE LAYERED BODY MANUFACTURING METHOD AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-01-11 WO disclosed
US-11859110-B2 Substrate laminated body and method of manufacturing substrate laminated body MITSUI CHEMICALS, INC. (JP) 2024-01-02 US disclosed
EP-3616903-B1 SUBSTRATE LAMINATED BODY AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATED BODY MITSUI CHEMICALS INC (JP) 2023-09-27 EP disclosed
US-20180334588-A1 SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING SEMICONDUCTOR PROCESSING MATERIAL, AND SEMICONDUCTOR DEVICE MITSUI CHEMICALS, INC. (JP) 2018-11-22 US disclosed
EP-3379565-A1 SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING PROCESSING MATERIAL FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE Mitsui Chemicals, Inc. (JP) 2018-09-26 EP disclosed
US-20160264710-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2016-09-15 US disclosed
US-9403932-B2 Process for producing silica-comprising polyol dispersions and their use for producing polyurethane materials BASF SE (DE) 2016-08-02 US disclosed
US-8901186-B2 Process for producing silica-comprising dispersions comprising polyetherols or polyether amines BASF SE (DE) 2014-12-02 US disclosed
US-20120065341-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2012-03-15 US disclosed
US-20110313070-A1 PROCESS FOR PRODUCING SILICA-COMPRISING DISPERSIONS COMPRISING POLYETHEROLS OR POLYETHER AMINES BASF SE (DE) 2011-12-22 US disclosed
US-20110266497-A1 PROCESS FOR PRODUCING SILICA-COMPRISING POLYOL DISPERSIONS AND THEIR USE FOR PRODUCING POLYURETHANE MATERIALS BASF SE (DE) 2011-11-03 US disclosed
US-20060004121-A1 Polymer-brush modified fillers for composites REGENTS OF THE UNIVERSITY OF COLORADO, THE 2006-01-05 US disclosed
US-4689422-A Novel ligand catalyst systems formed by reaction of carbonyl compounds with organosilicon compounds TEXACO INC. (US) 1987-08-25 US disclosed