Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL4483620

C=C(C)C(=O)OCCOC(=O)[S+]1CCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.40
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4476422 0.86 THRB (0.36) THRBTSHR
Trifluoromethanesulfonic Acid SCHEMBL5607105 0.74 CHRM5 (0.47) THRBTSHR
SCHEMBL60085 0.70 THRB (0.65) THRBTSHRALDH1A1
Cyclopentane SCHEMBL2397167 0.70 THRB (0.65) THRBTSHRALDH1A1
Cyclopropane SCHEMBL420362 0.70 THRB (0.65) THRBTSHRALDH1A1
Cyclohexane SCHEMBL117214 0.70 THRB (0.65) THRBTSHRALDH1A1
Potassium Ion SCHEMBL10003625 0.69 THRB (0.40) THRBTSHRALDH1A1
Lithium Ion SCHEMBL17439044 0.69 THRB (0.40) THRBTSHRALDH1A1
SCHEMBL32680098 0.69 THRB (0.41) THRBTSHR
Sulfuric Acid SCHEMBL1683726 0.68 THRB (0.63) THRBTSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7576223-B2 Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-18 US disclosed
US-20080269506-A1 Chemical amplification type resist composition YAMADA AIRI 2008-10-30 US disclosed
US-7396899-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL CO., LTD. (JP) 2008-07-08 US disclosed
US-20070123674-A1 Chemical amplification type resist composition YAMADA AIRI 2007-05-31 US disclosed
US-7160669-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-09 US disclosed
US-20040138353-A1 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080269506-A1 Chemical amplification type resist composition ASIC1, POLR2B, POLR2A THRB 3063/4885TSHR 3811/4885ALDH1A1 1431/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.