Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | SLC22A12 | Q96S37 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.41 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | BMP1 | P13497 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3183361 | 0.97 | GAA (0.51) | GAAKMT2ASLC22A12KDM4EPTGDR2 | |
| SCHEMBL2898284 | 0.95 | GAA (0.49) | GAAKMT2ASLC22A12KDM4EPTGDR2 | |
| SCHEMBL3192045 | 0.86 | SLC22A12 (0.39) | GAAKMT2ASLC22A12ALDH1A1MEN1 | |
| SCHEMBL451959 | 0.84 | KMT2A (0.46) | GAAKMT2ASLC22A12ALDH1A1MEN1 | |
| SCHEMBL5445938 | 0.83 | HSD11B1 (0.47) | KMT2ASLC22A12FFAR4ALDH1A1MEN1 | |
| SCHEMBL3204977 | 0.82 | SLC22A12 (0.42) | GAAKMT2ASLC22A12FFAR4ALDH1A1 | |
| SCHEMBL2956231 | 0.82 | PKM (0.41) | GAAKMT2ANFE2L2ALDH1A1NPC1 | |
| SCHEMBL38660618 | 0.82 | KAT6A (0.42) | GAAKMT2ASLC22A12FFAR4MAOB | |
| SCHEMBL2898422 | 0.82 | GAA (0.51) | GAAKMT2ASLC22A12KDM4EPTGDR2 | |
| SCHEMBL452162 | 0.81 | HSD11B1 (0.45) | KMT2ASLC22A12FFAR4ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 214 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-12449731-B2 | Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product | ISR CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| WO-2025075090-A1 | ADHESIVE COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE | 日東電工株式会社 | 2025-04-10 | — | — | WO | disclosed |
| WO-2025075091-A1 | ADHESIVE COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE | 日東電工株式会社 | 2025-04-10 | — | — | WO | disclosed |
| WO-2025041686-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041685-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12174538-B2 | Photosensitive resin composition, method for producing resist pattern film, method for producing plated formed product, and method for producing tin-silver plated-formed product | JSR CORPORATION (JP) | 2024-12-24 | — | — | US | disclosed |
| US-12158700-B2 | Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus | JSR CORPORATION (JP) | 2024-12-03 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | GAA 4403/4885KMT2A 1496/4885SLC22A12 4565/4885 |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | SMCHD1, PIM1, PIM2 | GAA 2794/4885KMT2A 407/4885SLC22A12 4619/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.