Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13966296 | 0.89 | THRB (0.30) | THRB | |
| Acrylic Acid Methyl Ester SCHEMBL28025359 | 0.80 | THRB (0.39) | THRB | |
| SCHEMBL31238662 | 0.78 | MEN1 (0.30) | — | |
| SCHEMBL28093554 | 0.77 | EPHX1 (0.44) | MAPTCYP2C19 | |
| SCHEMBL29391721 | 0.77 | EPHX1 (0.42) | CYP3A4CYP2C19 | |
| SCHEMBL63032 | 0.77 | EPHX1 (0.42) | CYP3A4CYP2C19 | |
| SCHEMBL75109 | 0.77 | — | — | |
| SCHEMBL29090337 | 0.77 | THRB (0.41) | THRBMAPTCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL9957309 | 0.77 | THRB (0.41) | THRBMAPTCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL8805010 | 0.77 | THRB (0.45) | THRBMAPTCYP3A4CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-5346668-A | — | — | None | — | — | JP | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-112585113-B | Process for distillative purification of fluorine-containing polymerizable monomers | 中央硝子株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116615410-A | Method for producing fluorine-containing polymer and composition | 中央硝子株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-07 | — | — | US | disclosed |
| WO-2022124182-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| US-6759176-B2 | COMPRISING AN ACRYLIC RESIN HAVING INCREASED SOLUBILITY TO ALKALINE DEVELOPER UPON EXPOSURE TO ACID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-07-06 | — | — | US | disclosed |
| US-20040058269-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-03-25 | — | — | US | disclosed |
| EP-0942018-B1 | (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO (JP) | 2003-03-12 | — | — | EP | disclosed |
| US-20020102492-A1 | Positive-working resist composition | JPMORGAN CHASE BANK | 2002-08-01 | — | — | US | disclosed |
| US-6388101-B1 | METHACRYLIC ACID ESTER OF 3-HYDROXY-3-METHYL-1-OXACYCLOPENTAN-2-ONE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-14 | — | — | US | disclosed |
| US-20020006576-A1 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-17 | — | — | US | disclosed |
| US-6214517-B1 | PHOTORESIST HAVING AN ESTER MOIETY AND HYDROLYZABLE GROUPS TOGETHER WITH AN ACID GENERATOR; ULTRAMICRO LITHOGRAPHY, INTEGRATED CIRCUITS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-10 | — | — | US | disclosed |
| US-6060207-A | LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-05-09 | — | — | US | disclosed |
| EP-0942018-A1 | (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 1999-09-15 | — | — | EP | disclosed |
| JP-H05346668-A | RESIST COMPOSITION AND PATTERN FORMING METHOD USING IT | FUJITSU LTD | 1993-12-27 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | AFF4, AFF1, AFF2 | THRB 4083/4885MAPT 3003/4885CYP3A4 1099/4885 |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | AFF1, AFF4, AFF2 | THRB 1246/4885MAPT 1415/4885CYP3A4 664/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | THRB 2068/4885MAPT 2474/4885CYP3A4 1747/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.