Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLO1 | Q04760 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1821536 | 0.87 | HSD11B1 (0.36) | MAPK1ALDH1A1HSD11B1TSHRL3MBTL1 | |
| SCHEMBL5893939 | 0.84 | ALDH1A1 (0.41) | NPSR1LMNAALDH1A1TSHRL3MBTL1 | |
| SCHEMBL12003305 | 0.83 | EPHX2 (0.32) | TSHREPHX2MAPT | |
| SCHEMBL283708 | 0.81 | EPHX2 (0.33) | ALDH1A1HSD11B1L3MBTL1HSD17B10EPHX2 | |
| SCHEMBL1271396 | 0.81 | L3MBTL1 (0.33) | HSD11B1L3MBTL1 | |
| SCHEMBL27914735 | 0.78 | EPHX2 (0.34) | L3MBTL1EPHX2 | |
| SCHEMBL3152896 | 0.78 | TSHR (0.34) | HSD11B1TSHREPHX2 | |
| SCHEMBL32688469 | 0.76 | EPHX2 (0.42) | GLO1NPSR1MAPK1ALDH1A1HSD11B1 | |
| SCHEMBL6329862 | 0.75 | — | — | |
| SCHEMBL28243229 | 0.75 | GLO1 (0.42) | GLO1NPSR1MAPK1LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200135454-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-30 | — | — | US | claimed |
| US-20190164746-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2019-05-30 | — | — | US | claimed |
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | claimed |
| US-20130344441-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-26 | — | — | US | claimed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| US-20060121390-A1 | High resolution resists for next generation lithographies | NATIONAL SCIENCE FOUNDATION | 2006-06-08 | — | — | US | claimed |
| CN-118339251-A | Release agent, adhesive composition, laminate, and method for producing semiconductor substrate | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-116981758-A | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | 英菲诺姆国际有限公司 | 2023-10-31 | — | — | CN | disclosed |
| CN-115668464-A | Composition for forming upper layer film and method for producing phase separation pattern | 日产化学株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-110730790-B | Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same | 中央硝子株式会社 | 2021-06-15 | — | — | CN | disclosed |
| US-20200135454-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-30 | — | — | US | disclosed |
| WO-2020035960-A1 | METHOD FOR PURIFYING POLYMERIZABLE FLUOROMONOMER BY DISTILLATION | セントラル硝子株式会社 | 2020-02-20 | — | — | WO | disclosed |
| WO-2006091375-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-08-31 | — | — | WO | disclosed |
| WO-2005061590-A1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2005-07-07 | — | — | WO | disclosed |
| EP-1497341-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1497339-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003089482-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |
| WO-2003089480-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |