SCHEMBL283708

SCHEMBL283708

COC(=O)C(C)=CC1C2CC3CC(C2)CC1C3

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 5/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
HSD17B10 Q99714 1/20 0.32
ALDH1A1 P00352 1/20 0.31
CHRNB2 P17787 1/20 0.31
CHRNA4 P43681 1/20 0.31
HSD11B1 P28845 2/20 0.31
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1271396 0.85 L3MBTL1 (0.33) L3MBTL1HSD11B1
SCHEMBL3152896 0.82 TSHR (0.34) EPHX2HSD11B1
SCHEMBL451262 0.81 GLO1 (0.38) EPHX2L3MBTL1HSD17B10ALDH1A1HSD11B1
SCHEMBL6329862 0.80
SCHEMBL584410 0.79 HSD11B1 (0.33) EPHX2L3MBTL1HSD17B10HSD11B1
SCHEMBL9649905 0.79 HSD11B1 (0.38) EPHX2L3MBTL1HSD17B10ALDH1A1HSD11B1
SCHEMBL244479 0.79 HSD11B1 (0.38) EPHX2L3MBTL1HSD17B10ALDH1A1HSD11B1
SCHEMBL1821536 0.78 HSD11B1 (0.36) EPHX2L3MBTL1ALDH1A1HSD11B1
SCHEMBL1825320 0.78 L3MBTL1 (0.31) L3MBTL1
SCHEMBL12003305 0.77 EPHX2 (0.32) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 438 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200135454-A1 METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2020-04-30 US claimed
EP-3642264-A1 CURABLE SILICONE COMPOSITION AND APPLICATIONS AND USES THEREOF Momentive Performance Materials Inc. (US) 2020-04-29 EP claimed
US-10429029-B2 Organic light emitting display device and method for fabricating the same LG DISPLAY CO., LTD. (KR) 2019-10-01 US claimed
US-10385210-B2 Curable silicone composition and applications and uses thereof MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2019-08-20 US claimed
US-20190164746-A1 METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2019-05-30 US claimed
WO-2018236679-A1 CURABLE SILICONE COMPOSITION AND APPLICATIONS AND USES THEREOF MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2018-12-27 WO claimed
US-20180362764-A1 CURABLE SILICONE COMPOSITION AND APPLICATIONS AND USES THEREOF MOMENTIVE PERFORMANCE MATERIALS INC. 2018-12-20 US claimed
WO-2013190406-A1 ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-12-27 WO claimed
US-20130344441-A1 ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-12-26 US claimed
US-8530009-B2 Liquid crystal display device including side supporting means and method of fabricating the same LG DISPLAY CO., LTD. (KR) 2013-09-10 US claimed
US-20130163255-A1 ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME LG DISPLAY CO., LTD. (KR) 2013-06-27 US claimed
US-20130021554-A1 LIQUID CRYSTAL DISPLAY DEVICE INCLUDING SIDE SUPPORTING MEANS AND METHOD OF FABRICATING THE SAME LG DISPLAY CO., LTD (KR) 2013-01-24 US claimed
US-7834113-B2 Photoresist compositions and processes for preparing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-16 US claimed
US-20060247400-A1 Photoresist compositions and processes for preparing the same U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-11-02 US claimed
US-20060121390-A1 High resolution resists for next generation lithographies NATIONAL SCIENCE FOUNDATION 2006-06-08 US claimed
US-11846885-B2 Topcoat compositions and photolithographic methods ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2023-12-19 US disclosed
CN-116970119-A Fluorine-containing resin for immersion photoresist and preparation method and application thereof 宁波南大光电材料有限公司 2023-10-31 CN disclosed
WO-2002017019-A2 OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2002-02-28 WO disclosed
US-20020009663-A1 Photoacid generators and photoresists comprising same SHIPLEY COMPANY, L.L.C. 2002-01-24 US disclosed
WO-2001063363-A2 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2001-08-30 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020009663-A1 Photoacid generators and photoresists comprising same GSS, TST, SQOR EPHX2 4158/4885L3MBTL1 4173/4885HSD17B10 336/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.