Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | PKM | P14618 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | HTR2C | P28335 | 1/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA3 | P07451 | 2/20 | 0.33 |
| ▸ | CA4 | P22748 | 2/20 | 0.33 |
| ▸ | CA6 | P23280 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4513230 | 1.00 | THRB (0.37) | THRBATMKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL3148835 | 0.74 | THRB (0.37) | THRBATMKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL9957230 | 0.73 | TSHR (0.34) | THRBHSD17B10MAPK1TDP1 | |
| SCHEMBL14691643 | 0.72 | ADAM17 (0.38) | THRBATMKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL183861 | 0.70 | HCAR2 (0.39) | THRBATMKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL6446355 | 0.70 | HCAR2 (0.39) | THRBATMKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL28466983 | 0.68 | CHRM3 (0.35) | THRBCA12CA9 | |
| SCHEMBL29386798 | 0.65 | — | — | |
| SCHEMBL31249564 | 0.65 | HCAR2 (0.36) | THRBKDM4EALDH1A1PKMHPGD | |
| SCHEMBL3133219 | 0.65 | HCAR2 (0.34) | THRBATMKDM4EALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1526584-B1 | Method of forming electroluminescent semiconducting nanocrystal patterned layer for an organic-inorganic hybrid electroluminescent devices, and organic-inorganic hybrid electroluminescent device using the same. | SAMSUNG ELECTRONICS CO LTD (KR) | 2017-06-14 | — | — | EP | claimed |
| US-8993494-B2 | Compositions comprising reverse micelles and methods for their use | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2015-03-31 | — | — | US | claimed |
| US-8911883-B2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-12-16 | — | — | US | claimed |
| US-8758864-B2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-06-24 | — | — | US | claimed |
| US-20130011635-A1 | PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTALS, PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-01-10 | — | — | US | claimed |
| WO-2012073385-A1 | COMPOSITIONS COMPRISING REVERSE MICELLES AND METHODS FOR THEIR USE | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2012-06-07 | — | — | WO | claimed |
| US-20120141681-A1 | COMPOSITIONS COMPRISING REVERSE MICELLES AND METHODS FOR THEIR USE | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2012-06-07 | — | — | US | claimed |
| US-7476487-B2 | Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-13 | — | — | US | claimed |
| US-20080290797-A1 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-27 | — | — | US | claimed |
| US-7199393-B2 | Photolithographic process to form a pattern, using an inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-04-03 | — | — | US | claimed |
| US-20060199039-A1 | Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-09-07 | — | — | US | claimed |
| US-20050161666-A1 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-07-28 | — | — | US | claimed |
| EP-1526584-A2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | Samsung Electronics Co., Ltd (KR) | 2005-04-27 | — | — | EP | claimed |
| JP-2101011-A | — | — | None | — | — | JP | disclosed |
| EP-3240047-B1 | PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2022-07-06 | — | — | EP | disclosed |
| EP-3240047-A1 | PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTALS, PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME | Samsung Electronics Co., Ltd. (KR) | 2017-11-01 | — | — | EP | disclosed |
| US-20060199039-A1 | Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-09-07 | — | — | US | disclosed |
| US-20050161666-A1 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-07-28 | — | — | US | disclosed |
| EP-1526584-A2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | Samsung Electronics Co., Ltd (KR) | 2005-04-27 | — | — | EP | disclosed |
| JP-H02101011-A | CARDIOTONIC AGENT | TSUMURA & CO | 1990-04-12 | — | — | JP | disclosed |