SCHEMBL452907

SCHEMBL452907

Cc1ccc([Si]([Cr][Si](c2ccc(C)cc2C)(c2ccc(C)cc2C)c2ccc(C)cc2C)(c2ccc(C)cc2C)c2ccc(C)cc2C)c(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.41
TP53 P04637 2/20 0.41
CYP1A2 P05177 3/20 0.36
CYP2A6 P11509 2/20 0.36
ALDH1A1 P00352 1/20 0.36
RAPGEF4 Q8WZA2 3/20 0.34
NQO2 P16083 1/20 0.32
CYP3A4 P08684 3/20 0.32
THRB P10828 1/20 0.32
ALOX15 P16050 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TRPA1 O75762 1/20 0.32
ACHE P22303 2/20 0.32
AMY1A P0DUB6 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ADRA2A P08913 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28033237 0.75 TDP1 (0.44) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL5708414 0.73 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL16707374 0.73 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1317920 0.73 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL7778417 0.73 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1686578 0.73 TDP1 (0.48) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1686941 0.73 TDP1 (0.48) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1992127 0.73 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1314725 0.71 TDP1 (0.41) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1317064 0.71 TDP1 (0.41) TDP1TP53CYP1A2CYP2A6ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11281102-B2 Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same CENTRAL GLASS COMPANY, LIMITED (JP) 2022-03-22 US disclosed
US-20200089116-A1 Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same CENTRAL GLASS COMPANY, LIMITED (JP) 2020-03-19 US disclosed
US-20170226241-A1 CHROMIUM-BASED CATALYST COMPONENT COMPRISING A MODIFIED INORGANIC OXIDE SUPPORT SAUDI BASIC INDUSTRIES CORPORATION (SA) 2017-08-10 US disclosed
US-9678425-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9678426-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
EP-3074127-A2 CHROMIUM-BASED CATALYST COMPONENT COMPRISING A METAL-HALIDE MODIFIED INORGANIC OXIDE SUPPORT Saudi Basic Industries Corporation (SA) 2016-10-05 EP disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
WO-2015078885-A2 CHROMIUM-BASED CATALYST COMPONENT COMPRISING A MODIFIED INORGANIC OXIDE SUPPORT SAUDI BASIC INDUSTRIES CORPORATION (SA) 2015-06-04 WO disclosed
US-20140221589-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation CENTRAL GLASS COMPANY, LIMITED (JP) 2014-08-07 US disclosed
US-20140220490-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation CENTRAL GLASS COMPANY, LIMITED (JP) 2014-08-07 US disclosed
US-8716385-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2014-05-06 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
US-20130177848-A1 Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same CENTRAL GLASS COMPANY LIMITED (JP) 2013-07-11 US disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Central Glass Company , Limited (JP) 2011-10-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation AFF1, FRG1, AFF2 TDP1 2942/4885TP53 4086/4885CYP1A2 2813/4885
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer ADH1A, ADH1C, ADH5 TDP1 1471/4885TP53 2678/4885CYP1A2 147/4885
US-11281102-B2 Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same AFF4, AFF1, AFF2 TDP1 2793/4885TP53 2110/4885CYP1A2 1846/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.