Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 16/20 | 0.44 |
| ▸ | CA1 | P00915 | 15/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.37 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4535203 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL965542 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL60138 | 1.00 | CA2 (0.44) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL51400 | 0.98 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL965951 | 0.93 | CA1 (0.39) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL217002 | 0.93 | HTR6 (0.38) | CA2CA1HSD11B1NR1H2NR1H3 | |
| SCHEMBL3139139 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3139675 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3136124 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 | |
| SCHEMBL3130361 | 0.93 | CA1 (0.43) | CA2CA1HSD11B1NR1H2NR1I2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| CN-122085599-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122085598-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| CN-113253569-A | Small molecule composition, photoresist composition and method for forming pattern on substrate | 上海邃铸科技有限公司 | 2021-08-13 | — | — | CN | disclosed |
| US-10831102-B2 | Photoactive polymer brush materials and EUV patterning using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-11-10 | — | — | US | disclosed |
| CN-111788236-A | Photoactive polymer brush materials and EUV patterning using the same | 国际商业机器公司 | 2020-10-16 | — | — | CN | disclosed |
| US-20060063103-A1 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-23 | — | — | US | disclosed |
| US-20050239001-A1 | use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects | HITACHI GLOBAL STORAGE NETHERLANDS B.V. (NL) | 2005-10-27 | — | — | US | disclosed |
| US-20050123852-A1 | Method for patterning a low activation energy photoresist | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050124774-A1 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-06-09 | — | — | US | disclosed |
| US-20050112382-A1 | Molecular photoresists containing nonpolymeric silsesquioxanes | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-05-26 | — | — | US | disclosed |