SCHEMBL4540167

SCHEMBL4540167

CCCC[Si](C)(C)N([Bi](N([Si](C)(C)CCCC)[Si](C)(C)CCCC)N([Si](C)(C)CCCC)[Si](C)(C)CCCC)[Si](C)(C)CCCC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL422241 0.72 DNM1 (0.33) LMNATSHR
SCHEMBL4543014 0.71
SCHEMBL9950371 0.70 TSHR (0.32) LMNATSHR
SCHEMBL4080294 0.68 ALDH1A1 (0.32) LMNATSHR
SCHEMBL11722355 0.68 DNM1 (0.31) LMNATSHR
SCHEMBL545794 0.68 LMNA (0.30) LMNATSHR
SCHEMBL5084776 0.65
SCHEMBL30238466 0.65 DNM1 (0.38) LMNATSHR
SCHEMBL681730 0.64
SCHEMBL3676139 0.64 TSHR (0.43) LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050089632-A1 Process for producing oxide films ASM INTERNATIONAL N.V. (NL) 2005-04-28 US claimed
US-7618681-B2 Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III) ASM INTERNATIONAL N.V. (NL) 2009-11-17 US disclosed
US-20050089632-A1 Process for producing oxide films ASM INTERNATIONAL N.V. (NL) 2005-04-28 US disclosed