SCHEMBL545794

SCHEMBL545794

CCCC[Si](C)(C)N([Co]N([Si](C)(C)CCCC)[Si](C)(C)CCCC)[Si](C)(C)CCCC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL422241 0.72 DNM1 (0.33) LMNATSHR
SCHEMBL9950371 0.70 TSHR (0.32) LMNATSHR
SCHEMBL4540167 0.68 LMNA (0.30) LMNATSHR
SCHEMBL4080294 0.68 ALDH1A1 (0.32) LMNATSHR
SCHEMBL11722355 0.68 DNM1 (0.31) LMNATSHR
SCHEMBL31114549 0.67 ALDH1A1 (0.37)
SCHEMBL3189996 0.65 TSHR (0.38) LMNATSHR
SCHEMBL5084776 0.65
SCHEMBL30238466 0.65 DNM1 (0.38) LMNATSHR
SCHEMBL681730 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240218503-A1 SELECTIVE COBALT DEPOSITION ON COPPER SURFACES APPLIED MATERIALS, INC. 2024-07-04 US disclosed
US-20240213088-A1 SUBTRACTIVE METALS AND SUBTRACTIVE METAL SEMICONDUCTOR STRUCTURES APPLIED MATERIALS, INC. 2024-06-27 US disclosed
US-11990368-B2 Doped selective metal caps to improve copper electromigration with ruthenium liner APPLIED MATERIALS, INC. (US) 2024-05-21 US disclosed
US-11959167-B2 Selective cobalt deposition on copper surfaces APPLIED MATERIALS, INC. (US) 2024-04-16 US disclosed
US-11923244-B2 Subtractive metals and subtractive metal semiconductor structures APPLIED MATERIALS, INC. (US) 2024-03-05 US disclosed
US-11875987-B2 Contacts having a geometry to reduce resistance INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2024-01-16 US disclosed
US-11384429-B2 Selective cobalt deposition on copper surfaces APPLIED MATERIALS, INC. (US) 2022-07-12 US disclosed
US-11373903-B2 Doped selective metal caps to improve copper electromigration with ruthenium liner APPLIED MATERIALS, INC. (US) 2022-06-28 US disclosed
US-11062993-B2 Contacts having a geometry to reduce resistance INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2021-07-13 US disclosed
US-20200194371-A1 CONTACTS HAVING A GEOMETRY TO REDUCE RESISTANCE INTERNATIONAL BUSINESS MACHINES CORPORATION 2020-06-18 US disclosed
WO-2010025068-A2 COBALT DEPOSITION ON BARRIER SURFACES APPLIED MATERIALS, INC. (US) 2010-03-04 WO disclosed
WO-2009134840-A2 SELECTIVE COBALT DEPOSITION ON COPPER SURFACES APPLIED MATERIALS, INC. (US) 2009-11-05 WO disclosed
WO-2009134925-A2 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN COPPER CONTACT APPLICATIONS APPLIED MATERIALS, INC. (US) 2009-11-05 WO disclosed
WO-2009134916-A2 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS APPLIED MATERIALS, INC. (US) 2009-11-05 WO disclosed
US-20090269507-A1 SELECTIVE COBALT DEPOSITION ON COPPER SURFACES APPLIED MATERIALS, INC. 2009-10-29 US disclosed
US-20090053426-A1 COBALT DEPOSITION ON BARRIER SURFACES APPLIED MATERIALS, INC. 2009-02-26 US disclosed
US-20090004850-A1 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS APPLIED MATERIALS, INC. 2009-01-01 US disclosed
US-20080268635-A1 PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN COPPER CONTACT APPLICATIONS APPLIED MATERIALS, INC. 2008-10-30 US disclosed
WO-2007121249-A2 PROCESS FOR FORMING COBALT-CONTAINING MATERIALS APPLIED MATERIALS, INC. (US) 2007-10-25 WO disclosed
US-20070202254-A1 PROCESS FOR FORMING COBALT-CONTAINING MATERIALS APPLIED MATERIALS, INC. 2007-08-30 US disclosed