Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 3/20 | 0.44 |
| ▸ | CA1 | P00915 | 6/20 | 0.43 |
| ▸ | CA2 | P00918 | 6/20 | 0.43 |
| ▸ | GAA | P10253 | 3/20 | 0.39 |
| ▸ | MMP2 | P08253 | 2/20 | 0.39 |
| ▸ | MMP13 | P45452 | 2/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | PKLR | P30613 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503836 | 0.98 | HSD11B1 (0.47) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL3126981 | 0.94 | HSD11B1 (0.44) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL270993 | 0.94 | HSD11B1 (0.44) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL3132698 | 0.93 | HSD11B1 (0.43) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL3144470 | 0.93 | HSD11B1 (0.43) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL3132264 | 0.93 | HSD11B1 (0.43) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL2914111 | 0.93 | HSD11B1 (0.43) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL1593151 | 0.90 | HSD11B1 (0.45) | HSD11B1PKMGAAKMT2AHTT | |
| SCHEMBL5857759 | 0.87 | HSD11B1 (0.43) | HSD11B1PKMCA1CA2GAA | |
| SCHEMBL5856494 | 0.85 | CA1 (0.43) | HSD11B1PKMCA1CA2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20200123343-A1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10233274-B2 | Curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2019-03-19 | — | — | US | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | disclosed |
| US-6383713-B1 | ADAMANTYL ACRYLATE POLYMERS AND ACID GENERATORS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | HSD11B1 4332/4885PKM 269/4885CA1 3547/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.