Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.47 |
| ▸ | RECQL | P46063 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.47 |
| ▸ | EGFR | P00533 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | FYN | P06241 | 2/20 | 0.47 |
| ▸ | MMP9 | P14780 | 2/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.47 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.47 |
| ▸ | MMP2 | P08253 | 1/20 | 0.47 |
| ▸ | MMP8 | P22894 | 1/20 | 0.47 |
| ▸ | CA6 | P23280 | 1/20 | 0.47 |
| ▸ | CDK2 | P24941 | 1/20 | 0.47 |
| ▸ | MMP12 | P39900 | 1/20 | 0.47 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.47 |
| ▸ | CA12 | O43570 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL27491460 | 0.87 | CA2 (0.52) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL7197107 | 0.87 | TDP1 (0.38) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL9567898 | 0.87 | CA2 (0.38) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL2098518 | 0.87 | ERN1 (0.41) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL7027835 | 0.85 | MAOB (0.39) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL29832777 | 0.85 | TRPA1 (0.50) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL28520846 | 0.85 | TTR (0.36) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL1988801 | 0.85 | TSHR (0.50) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL5434329 | 0.85 | TRPA1 (0.50) | ALDH1A1CA2HPGDALOX15RECQL | |
| SCHEMBL27343749 | 0.85 | ALOX15 (0.48) | ALDH1A1CA2HPGDALOX15RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1938251-A | Process for the monoalkylation of dihydroxy aromatic compounds | GEN ELECTRIC (US) | 2007-03-28 | — | — | CN | claimed |
| US-20260106328-A1 | COMPOSITION FOR ELECTROCHEMICAL DEVICE FUNCTIONAL LAYER, COMPOSITION PRECURSOR FOR ELECTROCHEMICAL DEVICE FUNCTIONAL LAYER, FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE, LAMINATE FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE | ZEON CORPORATION (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4614712-A1 | COMPOSITION FOR ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, COMPOSITION PRECURSOR FOR ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, LAMINATE FOR ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL ELEMENT | Zeon Corporation (JP) | 2025-09-10 | — | — | EP | disclosed |
| CN-120136703-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120136704-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| EP-4251696-B1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| EP-4127039-B1 | HIGH DARKNESS AND HIGH GLOSS DIMENSIONALLY STABLE THERMOPLASTIC SMMA MOLDING COMPOSITION | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| US-20240317968-A1 | HIGH CLARITY AND LOW HAZE UV STABILIZED STYRENE AND METHYL METHACRYLATE COPOLYMERS | INEOS STYROLUTION GROUP GMBH (DE) | 2024-09-26 | — | — | US | disclosed |
| CN-118234789-A | High clarity, low haze and UV stable styrene-methyl methacrylate copolymers | 英力士苯领集团股份公司 | 2024-06-21 | — | — | CN | disclosed |
| WO-2024096017-A1 | COMPOSITION FOR ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, COMPOSITION PRECURSOR FOR ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, ELECTROCHEMICAL ELEMENT FUNCTIONAL LAYER, LAMINATE FOR ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL ELEMENT | 日本ゼオン株式会社 | 2024-05-10 | — | — | WO | disclosed |
| US-20040087574-A1 | Spiro compounds and adhesion molecule inhibitors containing the same as the active ingredient | TORAY INDUSTRIES INC. (JP) | 2004-05-06 | — | — | US | disclosed |
| EP-1329451-A1 | SPIRO COMPOUNDS AND ADHESION MOLECULE INHIBITORS CONTAINING THE SAME AS THE ACTIVE INGREDIENT | TORAY INDUSTRIES, INC. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1312982-A1 | RADIATION-SENSITIVE COMPOSITION, INSULATING FILM AND ORGANIC EL DISPLAY ELEMENT | JSR Corporation (JP) | 2003-05-21 | — | — | EP | disclosed |
| US-20030054284-A1 | Radiation-sensitive composition, insulating film and organic el display element | JSR CORPORATION (JP) | 2003-03-20 | — | — | US | disclosed |
| US-5892037-A | Polymeric adducts of hindered amine-epoxides as stabilizers | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 1999-04-06 | — | — | US | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5541274-A | Polymeric adducts of hindered amine-epoxides as stabilizers | CIBA-GEIGY CORPORATION (US) | 1996-07-30 | — | — | US | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| US-4173592-A | MALEIMIDE ANILINE-PHENOL-FORMALDEHYDE CONDENSATE, POLYALLYLPHENYL ETHER OR POLYALLYLPHENOLIC COMPOUND | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1979-11-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040087574-A1 | Spiro compounds and adhesion molecule inhibitors containing the same as the active ingredient | VCAM1, ICAM1, SELL | ALDH1A1 94/4885CA2 3690/4885HPGD 484/4885 |
| US-20260106328-A1 | COMPOSITION FOR ELECTROCHEMICAL DEVICE FUNCTIONAL LAYER, COMPOSITION PRECURSOR FOR ELECTROCHEMICAL DEVICE FUNCTIONAL LAYER, FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE, LAMINATE FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE | HVCN1, L1CAM, EPCAM | ALDH1A1 1542/4885CA2 817/4885HPGD 910/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.