Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | ATM | Q13315 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PDE4A | P27815 | 1/20 | 0.31 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.31 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.31 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.31 |
| ▸ | GPX4 | P36969 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL28177773 | 0.95 | THRB (0.38) | THRBATMKMT2ACYP3A4CYP2C9 | |
| SCHEMBL9610627 | 0.90 | ALDH1A1 (0.34) | THRBALDH1A1ATMKMT2AMAPT | |
| Acrylic Acid Methyl Ester SCHEMBL28025359 | 0.88 | THRB (0.39) | THRBALDH1A1 | |
| SCHEMBL8398109 | 0.85 | THRB (0.38) | THRBMAPTCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL4955179 | 0.84 | NAAA (0.33) | THRB | |
| SCHEMBL8805010 | 0.82 | THRB (0.45) | THRBALDH1A1MAPTCYP3A4CYP2C9 | |
| SCHEMBL19996621 | 0.82 | THRB (0.45) | THRBALDH1A1MAPTCYP3A4CYP2C9 | |
| SCHEMBL8519172 | 0.79 | NAAA (0.31) | — | |
| SCHEMBL5237434 | 0.79 | ALDH1A1 (0.37) | ALDH1A1ATMKMT2AGPX4 | |
| SCHEMBL201767 | 0.78 | EPHX1 (0.42) | ALDH1A1CYP2C19HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-112585113-B | Process for distillative purification of fluorine-containing polymerizable monomers | 中央硝子株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116615410-A | Method for producing fluorine-containing polymer and composition | 中央硝子株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-07 | — | — | US | disclosed |
| WO-2022124182-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| US-6060207-A | LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-05-09 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |
| EP-0942018-A1 | (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 1999-09-15 | — | — | EP | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5863699-A | FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-01-26 | — | — | US | disclosed |
| US-5856071-A | Resist material including si-containing resist having acid removable group combined with photo-acid generator | FUJITSU LIMITED (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0645679-B1 | Resist material and pattern forming process | FUJITSU LTD (JP) | 1997-10-01 | — | — | EP | disclosed |
| EP-0663616-A2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 1995-07-19 | — | — | EP | disclosed |
| EP-0645679-A1 | Resist material and pattern forming process | FUJITSU LIMITED (JP) | 1995-03-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | AFF4, AFF1, AFF2 | THRB 4083/4885ALDH1A1 1410/4885ATM 4500/4885 |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | AFF1, AFF4, AFF2 | THRB 1246/4885ALDH1A1 950/4885ATM 3761/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | THRB 2068/4885ALDH1A1 865/4885ATM 3844/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.