Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5364269 | 0.88 | TSHR (0.36) | TSHR | |
| SCHEMBL13779642 | 0.86 | TSHR (0.39) | TSHR | |
| SCHEMBL16710938 | 0.84 | TSHR (0.44) | TSHRTHRB | |
| SCHEMBL16710870 | 0.83 | THRB (0.35) | TSHRTHRB | |
| SCHEMBL16710950 | 0.83 | TSHR (0.47) | TSHRTHRB | |
| SCHEMBL2773662 | 0.83 | THRB (0.31) | TSHRTHRB | |
| SCHEMBL303392 | 0.81 | TSHR (0.41) | TSHRTHRB | |
| SCHEMBL13888357 | 0.81 | THRB (0.31) | THRB | |
| SCHEMBL5012424 | 0.79 | THRB (0.37) | TSHRTHRB | |
| SCHEMBL20597927 | 0.79 | LMNA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | claimed |
| EP-4711518-A1 | COATED FIBERS AND MOLDED BODY USING SAME | Kuraray Co., Ltd. (JP) | 2026-03-18 | — | — | EP | disclosed |
| US-12460111-B2 | Reinforcing fibers and production method therefor, and molded article using same | KURARAY CO., LTD. (JP) | 2025-11-04 | — | — | US | disclosed |
| WO-2024237206-A1 | COATED FIBERS AND MOLDED BODY USING SAME | 株式会社クラレ | 2024-11-21 | — | — | WO | disclosed |
| CN-113454282-B | Reinforcing fiber, method for producing same, and molded article using same | 株式会社可乐丽 | 2024-02-13 | — | — | CN | disclosed |
| US-20230303808-A1 | EMULSION COMPOSITION AND METHOD FOR PRODUCING SAME | KURARAY CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4206233-A1 | EMULSION COMPOSITION AND METHOD FOR PRODUCING SAME | Kuraray Co., Ltd. (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-116348499-A | Emulsion composition and method for producing same | 株式会社可乐丽 | 2023-06-27 | — | — | CN | disclosed |
| EP-3933101-A1 | REINFORCING FIBER, METHOD FOR MANUFACTURING SAME, AND MOLDED BODY USING SAME | Kuraray Co., Ltd. (JP) | 2022-01-05 | — | — | EP | disclosed |
| CN-113454282-A | Reinforcing fiber, method for producing same, and molded body using same | 株式会社可乐丽 | 2021-09-28 | — | — | CN | disclosed |
| US-7306853-B2 | Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-12-11 | — | — | US | disclosed |
| US-7306853-B2 | Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-12-11 | — | — | US | disclosed |
| US-7199262-B2 | 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7199262-B2 | 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7199262-B2 | 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-04-03 | — | — | US | disclosed |
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | disclosed |
| US-20060009653-A1 | 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1505440-A2 | Positive resist composition and method of forming resist pattern using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-20050026073-A1 | Positive resist composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| US-4609715-A | RADICALLY POLYMERIZED | CENTRAL GLASS COMPANY, LIMITED (JP) | 1986-09-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060009653-A1 | 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same | HPD, ALDH1A1, HACL2 | TSHR 3555/4885THRB 3881/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.