SCHEMBL457222

SCHEMBL457222

CCc1nc(-c2ccccc2)c[nH]1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.56
ADORA3 P0DMS8 3/20 0.47
ADORA2A P29274 3/20 0.47
ADORA1 P30542 3/20 0.47
TP53 P04637 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
RAB9A P51151 4/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
PDGFRB P09619 1/20 0.39
DDAH1 O94760 1/20 0.39
TNKS2 Q9H2K2 1/20 0.39
NPC1 O15118 2/20 0.37
PKM P14618 1/20 0.37
ALOX15 P16050 1/20 0.37
RECQL P46063 1/20 0.37
MAPT P10636 1/20 0.36
TSHR P16473 1/20 0.36
ATM Q13315 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1917870 0.85 ADORA3 (0.50) SMN1; SMN2ADORA3ADORA2AADORA1TP53
SCHEMBL948854 0.83 GSK3B (0.44) SMN1; SMN2TP53RAB9ANPC1MAPT
SCHEMBL27909694 0.83 RAD51 (0.42) SMN1; SMN2ADORA3ADORA1L3MBTL1RAB9A
SCHEMBL14039561 0.83 METAP2 (0.47) SMN1; SMN2TP53RAB9AMEN1KMT2A
Hydrochloric Acid SCHEMBL27508453 0.83 SMN1; SMN2 (0.42) SMN1; SMN2ADORA3ADORA2AADORA1RAB9A
SCHEMBL6618330 0.82 GSK3B (0.44) SMN1; SMN2ADORA3ADORA2AADORA1TP53
SCHEMBL8012285 0.81 TLR8 (0.39) SMN1; SMN2ADORA3ADORA2AADORA1TP53
SCHEMBL8010665 0.81 SMN1; SMN2 (0.38) SMN1; SMN2ADORA3ADORA2AADORA1DDAH1
SCHEMBL19405233 0.81 ALDH1A1 (0.39) SMN1; SMN2ADORA3ADORA2AADORA1L3MBTL1
SCHEMBL28079633 0.81 NPC1 (0.42) SMN1; SMN2ADORA2AADORA1TP53L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119978718-A High-heat-conductivity epoxy resin composition for copper-clad plate and preparation method thereof 江西五阳新材料有限公司 2025-05-13 CN claimed
CN-119371819-A Glue solution, glue solution preparation method and method for manufacturing halogen-free high-Tg copper-clad plate 宁波甬强科技有限公司 2025-01-28 CN claimed
CN-119217811-A Low-dielectric high-heat-resistance copper-clad plate and preparation method thereof 宁波甬强科技有限公司 2024-12-31 CN claimed
CN-115458809-B Electrolyte and lithium ion battery comprising same 湖州昆仑亿恩科电池材料有限公司 2024-12-13 CN claimed
CN-118146614-A Hole plugging resin composition for circuit board, preparation method of hole plugging resin composition and hole plugging circuit board 珠海市板明科技有限公司 2024-06-07 CN claimed
CN-116178890-A Thermosetting resin composition, prepreg for PCB and copper-clad plate for PCB 深圳伊帕思新材料科技有限公司 2023-05-30 CN claimed
CN-115458809-A Electrolyte and lithium ion battery comprising same 香河昆仑新能源材料股份有限公司 2022-12-09 CN claimed
CN-112250999-A Heat-resistant epoxy resin composition, halogen-free middle-Tg copper-clad plate and preparation method thereof 广德龙泰电子科技有限公司 2021-01-22 CN claimed
CN-112175354-A Heat-resistant epoxy resin composition, lead-free high-Tg copper-clad plate and preparation method thereof 广德龙泰电子科技有限公司 2021-01-05 CN claimed
CN-112063111-A Modified epoxy resin composition, high-Tg low-loss laminated copper-clad plate and preparation method thereof 广德龙泰电子科技有限公司 2020-12-11 CN claimed
CN-101914265-A A kind of non-halogen phosphorus-containing flame retardant high-frequency epoxy resin based composition and the application in bonding sheet and copper-clad plate thereof GUANGZHOU MICA AVA ELECTRONIC MATERIALS CO LTD 2010-12-15 CN claimed
US-20100240811-A1 Thermosetting Resin Composition and Application Thereof ITEQ (DONGGUAN) CORPORATION (CN) 2010-09-23 US claimed
CN-101602881-A Thermosetting resin composition and application thereof ITEQ CORP (CN) 2009-12-16 CN claimed
CN-101481490-A Thermosetting resin composition and application thereof DONGGUAN ITEQ CORP (CN) 2009-07-15 CN claimed
EP-1270635-B1 Solvent-based process for manufacturing latent curing catalysts NAT STARCH CHEM INVEST (US) 2005-08-24 EP claimed
EP-0866819-B1 METHOD FOR PREPARING A CURING AGENT FOR EPOXY RESINS MINNESOTA MINING & MFG (US) 2000-01-26 EP claimed
EP-0866819-A1 METHOD FOR PREPARING A CURING AGENT FOR EPOXY RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-09-30 EP claimed
US-5801218-A IMIDAZOLE-EPOXY ADDUCTS AS CURING AGENTS FOR EPOXY RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-09-01 US claimed
US-5717011-A AGITATING MIXTURE OF EPOXY COMPOUND, IMIDAZOLE COMPOUND AND WATER WITH HEATING TO FORM CURING AGENT MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-02-10 US claimed
WO-1997021751-A1 METHOD FOR PREPARING A CURING AGENT FOR EPOXY RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-06-19 WO claimed