Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL4579351 | 0.89 | NAAA (0.36) | NAAATSHR | |
| Propene SCHEMBL4578199 | 0.86 | ALDH1A1 (0.42) | ALDH1A1CYP3A4ALOX15TSHRTDP1 | |
| Propene SCHEMBL143194 | 0.85 | NAAA (0.45) | NAAAALDH1A1TSHRGAARAB9A | |
| Propene SCHEMBL6440361 | 0.84 | TSHR (0.36) | ALDH1A1TSHRTDP1HSD17B10 | |
| 2-Methoxyethanol SCHEMBL3856721 | 0.83 | TSHR (0.36) | ALDH1A1CYP3A4ALOX15TSHRTDP1 | |
| Propene SCHEMBL28864444 | 0.82 | ALDH1A1 (0.40) | ALDH1A1ALOX15TSHRGAAHSD17B10 | |
| Propene SCHEMBL5145274 | 0.81 | ALDH1A1 (0.38) | ALDH1A1ALOX15TSHRHSD17B10 | |
| Propionic Acid SCHEMBL7662132 | 0.80 | NAAA (0.41) | NAAAALDH1A1TSHRGAAHSD17B10 | |
| 2-Methoxyethanol SCHEMBL4579796 | 0.79 | NAAA (0.40) | NAAAALDH1A1TSHRGAAHSD17B10 | |
| Propene SCHEMBL181618 | 0.78 | NAAA (0.52) | NAAAALDH1A1CYP3A4TSHRGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060046190-A1 | Positive resist composition and pattern forming method utilizing the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |