SCHEMBL4580828

SCHEMBL4580828

O=C(Cl)C12CC3CC(C(=O)Cl)(C1)CC(C(=O)Cl)(C3)C2

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.43
LMNA P02545 1/20 0.43
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
THRB P10828 1/20 0.39
MAPK1 P28482 1/20 0.39
HSD11B1 P28845 4/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
GAA P10253 2/20 0.36
NPSR1 Q6W5P4 1/20 0.35
PKM P14618 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CRHBP P24387 1/20 0.33
HTT P42858 1/20 0.33
CRHR2 Q13324 1/20 0.33
MCOLN3 Q8TDD5 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5082227 0.91 L3MBTL1 (0.41) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL5481640 0.91 L3MBTL1 (0.41) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL14947974 0.89 THRB (0.38) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL5402913 0.89 HSD11B1 (0.43) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL21439790 0.88
SCHEMBL692431 0.86 SMN1; SMN2 (0.52) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL14605888 0.85 SMN1; SMN2 (0.35) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL28699840 0.84 HSD11B1 (0.43) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL3318267 0.82 MEN1 (0.56) SMN1; SMN2LMNAMEN1KMT2AGAA
SCHEMBL19866155 0.82 SMN1; SMN2 (0.33) SMN1; SMN2LMNAMEN1KMT2ATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114721221-A 193nm molecular glass photoresist and preparation method thereof 南通林格橡塑制品有限公司 2022-07-08 CN claimed
US-20080318156-A1 Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography CORNELL RESEARCH FOUNDATION, INC. 2008-12-25 US claimed
EP-1991910-A1 ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY Cornell Research Foundation, Inc. (US) 2008-11-19 EP claimed
WO-2007094784-A1 ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY CORNELL RESEARCH FOUNDATION, INC. (US) 2007-08-23 WO claimed
US-20240392150-A1 Resin Particle Dispersion for Inkjet Printing AGFA NV (BE) 2024-11-28 US disclosed
EP-4441155-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2024-10-09 EP disclosed
EP-4441154-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2024-10-09 EP disclosed
CN-118475659-A Resin particle dispersion for inkjet printing 爱克发有限公司 2024-08-09 CN disclosed
CN-118355080-A Resin particle dispersion for inkjet printing 爱克发有限公司 2024-07-16 CN disclosed
CN-117917395-A Novel compound for light-emitting element and organic light-emitting element comprising same 东进世美肯株式会社 2024-04-23 CN disclosed
WO-2023099254-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2023-06-08 WO disclosed
WO-2023099257-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2023-06-08 WO disclosed
US-20060264667-A1 Adamantanetricarboxylic acid derivatives NAGANO SHINYA 2006-11-23 US disclosed
US-7102027-B2 Adamantanetricarboxylic acid derivatives DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-09-05 US disclosed
EP-1683822-A1 PREPOLYMER, PREPOLYMER COMPOSITION, HIGH MOLECULAR WEIGHT POLYMER HAVING STRUCTURE CONTAINING HOLE AND ELECTRICALLY INSULATING FILM Daicel Chemical Industries, Ltd. (JP) 2006-07-26 EP disclosed
EP-1681284-A1 AROMATIC POLYAMINE DERIVATIVE Daicel Chemical Industries, Ltd. (JP) 2006-07-19 EP disclosed
EP-1505053-A1 Adamantanetricarboxylic acid derivatives Daicel Chemical Industries, Ltd. (JP) 2005-02-09 EP disclosed
US-20040242923-A1 Adamantanetricarboxylic acid derivatives DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-12-02 US disclosed
EP-1462471-A1 Dielectric films and materials thereof Daicel Chemical Industries, Ltd. (JP) 2004-09-29 EP disclosed
US-20040175858-A1 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040242923-A1 Adamantanetricarboxylic acid derivatives HCAR1, CA1, ALDH7A1 SMN1; SMN2 2424/4885LMNA 1974/4885MEN1 1203/4885
US-20060264667-A1 Adamantanetricarboxylic acid derivatives CA1, HCAR1, ALDH7A1 SMN1; SMN2 2289/4885LMNA 1367/4885MEN1 1259/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.