SCHEMBL692431

SCHEMBL692431

O=C(Cl)C12CC3CC(C1)CC(C(=O)Cl)(C3)C2

nearest known ligand 0.52

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.52
LMNA P02545 1/20 0.52
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
THRB P10828 1/20 0.47
MAPK1 P28482 1/20 0.47
GAA P10253 2/20 0.43
NPSR1 Q6W5P4 1/20 0.42
HSD11B1 P28845 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
PKM P14618 1/20 0.40
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5562998 0.91 L3MBTL1 (0.51) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL4997154 0.88 THRB (0.43) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL4580828 0.86 SMN1; SMN2 (0.43) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL966107 0.86 THRB (0.65) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL3188989 0.86 HSD11B1 (0.56) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL8957767 0.84 TSHR (0.51) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL28492217 0.84 THRB (0.41) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL5806269 0.84 LMNA (0.46) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL14382346 0.84 GAA (0.41) SMN1; SMN2LMNAMEN1KMT2ATHRB
SCHEMBL7719840 0.84 POLB (0.50) SMN1; SMN2LMNAMEN1KMT2ATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122037131-A Water-based bio-based polyurethane dispersoid for ink and preparation method thereof 广东彩格科技有限公司 2026-05-15 CN claimed
CN-119971800-A High-stability anti-pollution efficient composite reverse osmosis membrane and preparation method thereof 中国矿业大学(北京) 2025-05-13 CN claimed
CN-117181020-A Method for preparing nanofiltration membrane and nanofiltration membrane prepared by same 沃顿科技股份有限公司 2023-12-08 CN claimed
WO-2023231317-A1 NANOFILTRATION MEMBRANE PREPARATION METHOD AND NANOFILTRATION MEMBRANE PREPARED THEREBY 沃顿科技股份有限公司 2023-12-07 WO claimed
CN-114669206-B Polyketone, gas separation membrane, and preparation method and application thereof 南阳师范学院 2023-10-24 CN claimed
CN-116769161-A Polyimide with low CTE and high light transmittance, diamine monomer thereof and preparation method thereof 河北科技大学 2023-09-19 CN claimed
CN-116217406-A Synthesis method of 1, 3-adamantane diamine 西安淳甄新材料有限公司 2023-06-06 CN claimed
CN-112481001-A Engine lubricating oil and preparation method thereof 麻义林 2021-03-12 CN claimed
US-10828608-B2 Semipermeable membrane and preparation method thereof ZHEJIANG UNIVERSITY (CN) 2020-11-10 US claimed
US-20190282967-A1 SEMIPERMEABLE MEMBRANE AND PREPARATION METHOD THEREOF LORD CORPORATION 2019-09-19 US claimed
US-20170335063-A1 Polyamic Acid Composition, Polyamideimide Film Thereof and Method for Preparing Polyamideimide Film SK INNOVATION CO., LTD. (KR) 2017-11-23 US claimed
CN-122037131-A Water-based bio-based polyurethane dispersoid for ink and preparation method thereof 广东彩格科技有限公司 2026-05-15 CN disclosed
US-12427709-B2 Method for manufacturing polyimide-based film and polyimide-based film manufacture KOLON INDUSTRIES, INC. (KR) 2025-09-30 US disclosed
EP-4317273-B1 POLYIMIDE-BASED FILM KOLON INC (KR) 2025-05-28 EP disclosed
CN-119971800-A High-stability anti-pollution efficient composite reverse osmosis membrane and preparation method thereof 中国矿业大学(北京) 2025-05-13 CN disclosed
US-20020042496-A1 Novel polyesters and production process thereof DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-11 US disclosed
EP-1164125-A1 ADAMANTANE DERIVATIVES AND PROCESSES FOR THE PREPARATION THEREOF Daicel Chemical Industries, Ltd. (JP) 2001-12-19 EP disclosed
EP-1148043-A1 PROCESS FOR PRODUCING t-BUTYL ESTERS OF BRIDGED-RING POLYCARBOXYLIC ACIDS Daicel Chemical Industries, Ltd. (JP) 2001-10-24 EP disclosed
US-6156486-A Method for pattern formation and process for preparing semiconductor device HITACHI, LTD. (JP) 2000-12-05 US disclosed
US-6017680-A Method for pattern formation and process for preparing semiconductor device HITACHI, LTD. (JP) 2000-01-25 US disclosed