Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.82 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.82 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.71 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.71 |
| ▸ | MAPT | P10636 | 3/20 | 0.71 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.71 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.71 |
| ▸ | HPGD | P15428 | 1/20 | 0.71 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.71 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.71 |
| ▸ | HEXA | P06865 | 6/20 | 0.68 |
| ▸ | HEXB | P07686 | 6/20 | 0.68 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.68 |
| ▸ | RAB9A | P51151 | 2/20 | 0.62 |
| ▸ | GAA | P10253 | 1/20 | 0.62 |
| ▸ | OGA | O60502 | 1/20 | 0.61 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.59 |
| ▸ | LTA4H | P09960 | 1/20 | 0.59 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.59 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.59 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3134908 | 0.90 | MEN1 (1.00) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL9290373 | 0.89 | MEN1 (0.67) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL10018574 | 0.88 | KMT2A (0.89) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL29297665 | 0.85 | MEN1 (0.66) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL10018578 | 0.85 | MEN1 (0.66) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL3470386 | 0.85 | MEN1 (0.66) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL22473989 | 0.85 | MEN1 (0.62) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL30098360 | 0.84 | CA12 (0.66) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL14023167 | 0.84 | NPSR1 (0.60) | MEN1KMT2AKDM4EALDH1A1HPGD | |
| SCHEMBL135305 | 0.84 | CA12 (0.66) | MEN1KMT2AKDM4EALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107698648-A | Naphthylimide derivative containing cholesterol and synthesis and application thereof | 大连理工大学 | 2018-02-16 | — | — | CN | claimed |
| US-20240224999-A1 | METABOLIC INHIBITORS FOR CONTROLLING BIOFILM | MC US 3 LLC (US) | 2024-07-11 | — | — | US | disclosed |
| US-20240224999-A1 | METABOLIC INHIBITORS FOR CONTROLLING BIOFILM | MC US 3 LLC (US) | 2024-07-11 | — | — | US | disclosed |
| US-20230183640-A1 | METABOLIC INHIBITORS WITH EFFICACY FOR INHIBITING SULFIDE PRODUCTION IN HARSH ENVIRONMENTS | LANXESS CORPORATION | 2023-06-15 | — | — | US | disclosed |
| US-20230183640-A1 | METABOLIC INHIBITORS WITH EFFICACY FOR INHIBITING SULFIDE PRODUCTION IN HARSH ENVIRONMENTS | LANXESS CORPORATION | 2023-06-15 | — | — | US | disclosed |
| CN-115427462-A | Fluorescent macromolecules and uses thereof | 昆士兰科技大学 | 2022-12-02 | — | — | CN | disclosed |
| US-20220252981-A1 | HIGHLY SEQUENCED COPOLYMER FOR DUAL-TONE PHOTORESISTS, RESIST COMPOSITION AND PATTERNING PROCESS THEREOF | Canton Litho Material Technology Inc. (CN) | 2022-08-11 | — | — | US | disclosed |
| CN-108884638-B | Polysaccharide derivatives as optical brighteners | 奥布专科学院 | 2021-08-31 | — | — | CN | disclosed |
| CN-112876495-A | Parthenolide derivative, pharmaceutical composition thereof, preparation method and application thereof | 中国医学科学院药物研究所 | 2021-06-01 | — | — | CN | disclosed |
| US-10988716-B2 | Polysaccharide derivatives as optical brightening agents | ABO AKADEMI UNIVERSITY (FI) | 2021-04-27 | — | — | US | disclosed |
| US-20090170840-A1 | NS1 protein inhibitors | THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM | 2009-07-02 | — | — | US | disclosed |
| US-20090170840-A1 | NS1 protein inhibitors | THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM | 2009-07-02 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-20080269482-A1 | Use of Rylene Derivatives as Photosensitizers in Solar Cells | BASF SE (DE) | 2008-10-30 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090170840-A1 | NS1 protein inhibitors | MAVS, SERPINB1, SPINT2 | MEN1 3271/4885KMT2A 2284/4885KDM4E 2872/4885 |
| US-20240224999-A1 | METABOLIC INHIBITORS FOR CONTROLLING BIOFILM | RIMKLA, HDHD5, SCD | MEN1 4370/4885KMT2A 1215/4885KDM4E 1253/4885 |
| US-10988716-B2 | Polysaccharide derivatives as optical brightening agents | ALG1, CSGALNACT1, MAN1B1 | MEN1 1790/4885KMT2A 3606/4885KDM4E 4447/4885 |
| US-20080269482-A1 | Use of Rylene Derivatives as Photosensitizers in Solar Cells | NR2E3, NR2E1, NR1D2 | MEN1 1376/4885KMT2A 940/4885KDM4E 1430/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.