Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | WDR5 | P61964 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.30 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1089447 | 0.76 | ALDH1A1 (0.43) | ALDH1A1HTTLMNA | |
| SCHEMBL4279667 | 0.72 | LMNA (0.42) | ALDH1A1LMNA | |
| SCHEMBL3975777 | 0.70 | SMN1; SMN2 (0.42) | ALDH1A1HTTLMNA | |
| SCHEMBL16355399 | 0.70 | LMNA (0.43) | ALDH1A1LMNA | |
| SCHEMBL562964 | 0.69 | ALDH1A1 (0.43) | ALDH1A1HTTLMNA | |
| SCHEMBL17298623 | 0.67 | ALDH1A1 (0.50) | ALDH1A1HTTLMNA | |
| SCHEMBL24335748 | 0.66 | LMNA (0.37) | ALDH1A1HTTLMNA | |
| SCHEMBL384657 | 0.66 | ALDH1A1 (0.44) | ALDH1A1HTTLMNA | |
| SCHEMBL31757009 | 0.66 | ALDH1A1 (0.44) | ALDH1A1HTTLMNA | |
| SCHEMBL7765176 | 0.65 | LMNA (0.50) | ALDH1A1WDR5LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1579272-A4 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITIONS FOR USE IN BILAYER IMAGING SYSTEMS | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-12-17 | — | — | EP | disclosed |
| US-7018776-B2 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-03-28 | — | — | US | disclosed |
| EP-1609026-A2 | PROCESS FOR PRODUCING A HEAT RESISTANT RELIEF STRUCTURE | FujiFilm Electronic Materials USA, Inc. (US) | 2005-12-28 | — | — | EP | disclosed |
| EP-1579272-A2 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITIONS FOR USE IN BILAYER IMAGING SYSTEMS | Fujifilm Electronic Materials USA, Inc. (US) | 2005-09-28 | — | — | EP | disclosed |
| EP-1299774-A4 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPEC CHEM INC (US) | 2005-06-08 | — | — | EP | disclosed |
| US-6855476-B2 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-02-15 | — | — | US | disclosed |
| US-20040161711-A1 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | disclosed |
| US-20040161619-A1 | Process for producing a heat resistant relief structure | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | disclosed |
| WO-2004055592-A2 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOISTIONS FOR USE IN BILAYER IMAGING SYSTEMS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | disclosed |
| WO-2004055593-A2 | PROCESS FOR PRODUCING A HEAT RESISTANT RELIEF STRUCTURE | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | disclosed |
| EP-1299774-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |