SCHEMBL562964

SCHEMBL562964

Cc1ccc(S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)C)cc1C

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
HTT P42858 2/20 0.43
TDP1 Q9NUW8 2/20 0.41
LMNA P02545 1/20 0.41
TSHR P16473 1/20 0.40
PKM P14618 3/20 0.38
KMT2A Q03164 3/20 0.36
YAP1 P46937 1/20 0.36
TEAD4 Q15561 1/20 0.36
GAA P10253 1/20 0.36
POLB P06746 1/20 0.36
MEN1 O00255 1/20 0.35
GFER P55789 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL563251 0.83 ALDH1A1 (0.40) ALDH1A1HTTLMNAKMT2AGAA
SCHEMBL6934019 0.76 LMNA (0.50) ALDH1A1HTTTDP1LMNATSHR
SCHEMBL29077457 0.69 LMNA (0.53) ALDH1A1HTTTDP1LMNATSHR
SCHEMBL4586446 0.69 ALDH1A1 (0.35) ALDH1A1HTTLMNA
SCHEMBL1089447 0.65 ALDH1A1 (0.43) ALDH1A1HTTTDP1LMNAKMT2A
SCHEMBL2863852 0.65 ALDH1A1 (0.43) ALDH1A1HTTLMNAPKMKMT2A
SCHEMBL12180488 0.64 LMNA (0.57) ALDH1A1HTTTDP1LMNATSHR
SCHEMBL994541 0.64 TDP1 (0.61) ALDH1A1HTTTDP1LMNATSHR
SCHEMBL30487906 0.64 LMNA (0.61) ALDH1A1HTTTDP1LMNATSHR
SCHEMBL83885 0.64 LMNA (0.61) ALDH1A1HTTTDP1LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8053158-B2 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-11-08 US claimed
US-20070202436-A1 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-30 US claimed
US-8580484-B2 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-11-12 US disclosed
US-20120034735-A1 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns LEE SANG KYUN (KR) 2012-02-09 US disclosed
US-8053158-B2 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-11-08 US disclosed
US-20070202436-A1 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-30 US disclosed
US-7256419-B2 Composition for forming organic insulating film and organic insulating film formed from the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-14 US disclosed
EP-1542241-B1 Composition for forming organic insulating film and organic insulating film formed from the same SAMSUNG ELECTRONICS CO LTD (KR) 2006-09-27 EP disclosed
US-20050127355-A1 Composition for forming organic insulating film and organic insulating film formed from the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-06-16 US disclosed
EP-1542241-A1 Composition for forming organic insulating film and organic insulating film formed from the same Samsung Electronics Co., Ltd (KR) 2005-06-15 EP disclosed