Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.43 |
| ▸ | RECQL | P46063 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | MMP1 | P03956 | 1/20 | 0.40 |
| ▸ | MMP2 | P08253 | 1/20 | 0.40 |
| ▸ | MMP9 | P14780 | 1/20 | 0.40 |
| ▸ | MMP8 | P22894 | 1/20 | 0.40 |
| ▸ | MMP13 | P45452 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 3/20 | 0.40 |
| ▸ | NOD2 | Q9HC29 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2863852 | 0.86 | ALDH1A1 (0.43) | ALDH1A1RECQLGAAKMT2AMEN1 | |
| SCHEMBL3975777 | 0.83 | SMN1; SMN2 (0.42) | ALDH1A1KMT2ACA1CA2MMP1 | |
| SCHEMBL9010795 | 0.83 | CES2 (0.48) | ALDH1A1RECQLGAAKMT2ALMNA | |
| SCHEMBL384364 | 0.82 | CES2 (0.51) | ALDH1A1RECQLKMT2AMEN1CYP3A4 | |
| SCHEMBL384657 | 0.81 | ALDH1A1 (0.44) | ALDH1A1RECQLGAAKMT2AMEN1 | |
| SCHEMBL563251 | 0.81 | ALDH1A1 (0.40) | ALDH1A1RECQLGAAKMT2AMEN1 | |
| SCHEMBL384366 | 0.79 | CES2 (0.51) | ALDH1A1RECQLGAAKMT2AMEN1 | |
| SCHEMBL383775 | 0.78 | ALDH1A1 (0.41) | ALDH1A1RECQLGAAKMT2AMEN1 | |
| SCHEMBL36092 | 0.77 | GAA (0.48) | ALDH1A1GAAKMT2AMEN1CA1 | |
| SCHEMBL6932211 | 0.77 | CES2 (0.56) | ALDH1A1GAAKMT2AMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-119173819-A | Bio-based solvent for negative imaging | 菲利普·德内·于斯塔德 | 2024-12-20 | — | — | CN | disclosed |
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| US-11976170-B2 | Polybenzoxazole precursor and application thereof | MICROCOSM TECHNOLOGY CO., LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-20230041833-A1 | Polybenzoxazole Precursor and Application Thereof | MICROCOSM TECHNOLOGY CO., LTD. (TW) | 2023-02-09 | — | — | US | disclosed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-1636648-B1 | NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-08-12 | — | — | EP | disclosed |
| US-6312870-B1 | t-butyl cinnamate polymers and their use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2001-11-06 | — | — | US | disclosed |
| US-6309793-B1 | PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. | 2001-10-30 | — | — | US | disclosed |
| EP-1137675-A1 | PREPARATION OF PARTIALLY CROSS-LINKED POLYMERS AND THEIR USE IN PATTERN FORMATION | Arch Specialty Chemicals, Inc. (US) | 2001-10-04 | — | — | EP | disclosed |
| US-6262181-B1 | AS COMPONENT OF PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. | 2001-07-17 | — | — | US | disclosed |
| EP-1086156-A1 | PRODUCTION OF ACETAL DERIVATIZED HYDROXYL AROMATIC POLYMERS AND THEIR USE IN RADIATION SENSITIVE FORMULATIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-03-28 | — | — | EP | disclosed |
| US-6159653-A | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-12-12 | — | — | US | disclosed |
| US-6133412-A | ACID CATALYZED ACETALIZATION OF A VINYL ETHER BY REACTING WITH BOTH A HYDROXY AROMATIC MONOMER OR POLYMER AND A MONOALCOHOL TO FORM PHOTORESIST RESIN | ARCH CHEMICALS, INC. (US) | 2000-10-17 | — | — | US | disclosed |
| US-6072006-A | REACTING POLYMER WITH PENDANT HYDROXYL OR CARBOXYL GROUPS WITH POLYVINYL ETHER IN PRESENCE OF ACID CATALYST TO FORM CROSSLINKED POLYMER | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-06-06 | — | — | US | disclosed |
| WO-2000027891-A1 | PREPARATION OF PARTIALLY CROSS-LINKED POLYMERS AND THEIR USE IN PATTERN FORMATION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-05-18 | — | — | WO | disclosed |
| WO-1999052957-A1 | PRODUCTION OF ACETAL DERIVATIZED HYDROXYL AROMATIC POLYMERS AND THEIR USE IN RADIATION SENSITIVE FORMULATIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 1999-10-21 | — | — | WO | disclosed |