Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ATP4AATP4BAXLBTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CHRM2CHRM3CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4FLT3HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3KCNH2KMT2AMAP2K1MAP2K2MEN1MLNRMPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PLK4PPARGRENS1PR1SLC6A2SLC6A3SLC6A4SMOTYK2atpAatpBatpCatpDatpEatpFatpFHatpGpol
The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A known ✓ | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 4/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.53 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 8/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.32 |
| ▸ | RECQL | P46063 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.32 |
| ▸ | GABRR2 | P28476 | 2/20 | 0.32 |
| ▸ | BLM | P54132 | 2/20 | 0.32 |
| ▸ | GABRR3 | A8MPY1 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Maleic Acid SCHEMBL4603806 | 1.00 | TSHR (0.53) | TSHRTP53EGLN1EGLN3LMNA | |
| Fumaric Acid SCHEMBL5676045 | 1.00 | TSHR (0.53) | TSHRTP53EGLN1EGLN3LMNA | |
| Maleic Acid SCHEMBL272884 | 0.97 | TSHR (0.56) | TSHRTP53EGLN1EGLN3LMNA | |
| Fumaric Acid SCHEMBL2342320 | 0.97 | TSHR (0.56) | TSHRTP53EGLN1EGLN3LMNA | |
| Fumaric Acid SCHEMBL4626269 | 0.97 | TSHR (0.56) | TSHRTP53EGLN1EGLN3LMNA | |
| Maleic Acid SCHEMBL4626935 | 0.97 | TSHR (0.56) | TSHRTP53EGLN1EGLN3LMNA | |
| Fumaric Acid SCHEMBL272885 | 0.97 | TSHR (0.56) | TSHRTP53EGLN1EGLN3LMNA | |
| Vinyl Ether SCHEMBL9322572 | 0.85 | HCAR2 (0.46) | TSHRTP53EGLN1EGLN3LMNA | |
| Vinyl Ether SCHEMBL27430610 | 0.83 | HCAR2 (0.44) | TSHRTP53EGLN1EGLN3LMNA | |
| Vinyl Ether SCHEMBL8967458 | 0.83 | HCAR2 (0.44) | TSHRTP53EGLN1EGLN3LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108271380-B | Antifouling composition | 佐敦公司 | 2020-10-23 | — | — | CN | claimed |
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| CN-108271380-B | Antifouling composition | 佐敦公司 | 2020-10-23 | — | — | CN | disclosed |
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | disclosed |
| EP-2548739-A2 | Lithographic printing plate precursor | Fujifilm Corporation (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-1673222-B1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | KODAK GRAPHIC COMM GMBH (DE) | 2008-07-09 | — | — | EP | disclosed |
| US-20070292809-A1 | Process for the Production of Double-Layer Heat-Sensitive Imageable Elements | KODAK POLYCHROME GRAPHICS, GMBH (DE) | 2007-12-20 | — | — | US | disclosed |
| EP-1287985-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1673222-A1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2006-06-28 | — | — | EP | disclosed |
| US-6228559-B1 | PHOTOSENSITVE LAYER ABD SILICONE RUBBER ON SUPPORT | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-08 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-1038890-A1 | Dendritic polymers and their preparation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| EP-1039346-A1 | Resist compositions and pattering process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5658708-A | RADIATION ABSORBING MATERIAL CONTAINING ENOL ETHER GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| US-5637428-A | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-10 | — | — | US | disclosed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | disclosed |
| EP-0536690-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-14 | — | — | EP | disclosed |