SCHEMBL4604358

SCHEMBL4604358

C#CCOc1ccc(C(=O)NC2CC2)c(CC)c1OC

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 1/20 0.41
TAS1R1 Q7RTX1 1/20 0.41
TAS1R2 Q8TE23 1/20 0.41
HTR2A P28223 1/20 0.40
ALDH1A1 P00352 2/20 0.40
POLB P06746 1/20 0.40
PTK2 Q05397 1/20 0.39
DRD3 P35462 1/20 0.39
CNR2 P34972 9/20 0.39
CNR1 P21554 5/20 0.39
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
MAPT P10636 1/20 0.38
KMT2A Q03164 1/20 0.38
PDE4B Q07343 1/20 0.38
HPGD P15428 2/20 0.38
SLC6A12 P48065 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4602808 0.96 HPGD (0.44) ALDH1A1PTK2CNR2CNR1HPGD
SCHEMBL4605222 0.96 HPGD (0.41) HTR2AALDH1A1CNR2CNR1HPGD
SCHEMBL4604638 0.95 ALDH1A1 (0.46) ALDH1A1CNR2CNR1HPGD
SCHEMBL4603249 0.88 HTR2A (0.41) TAS1R3TAS1R1TAS1R2HTR2AALDH1A1
SCHEMBL4602234 0.83 KDM4E (0.45) TAS1R3TAS1R1TAS1R2ALDH1A1POLB
SCHEMBL4603506 0.83 HPGD (0.45) HTR2AALDH1A1CNR2CNR1MEN1
SCHEMBL4602587 0.83 HPGD (0.42) HTR2AALDH1A1POLBCNR2CNR1
SCHEMBL4604443 0.83 TAS1R3 (0.50) TAS1R3TAS1R1TAS1R2CNR2CNR1
SCHEMBL4603541 0.80 ALDH1A1 (0.48) ALDH1A1POLBPTK2CNR2CNR1
SCHEMBL4603116 0.78 ALDH1A1 (0.42) TAS1R3TAS1R1TAS1R2HTR2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1940780-A1 AMIDE COMPOUNDS AND THEIR USE SUMITOMO CHEMICAL CO., LTD. (JP) 2008-07-09 EP disclosed
WO-2007049728-A1 AMIDE COMPOUNDS AND THEIR USE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-03 WO disclosed