SCHEMBL4611862

SCHEMBL4611862

C=C(COCC(C(=O)O)=C(C1CCCCO1)C1CCCCO1)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL195684 0.78 CES2 (0.32)
SCHEMBL26187811 0.70 MEN1 (0.44)
SCHEMBL217171 0.68 NOS2 (0.38) TP53
SCHEMBL7939206 0.67 GLA (0.37)
SCHEMBL351637 0.67 TET2 (0.40)
SCHEMBL7714154 0.66 TDP1 (0.38) TP53
SCHEMBL195104 0.65 GRIK1 (0.35)
SCHEMBL534243 0.64 HPGD (0.41) TP53
SCHEMBL8996569 0.64 EPHX1 (0.38)
SCHEMBL4611860 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1304340-B1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS MITSUBISHI RAYON CO (JP) 2008-10-29 EP disclosed
US-6927011-B2 Resins for resists and chemically amplifiable resist compositions MITSUBISHI RAYON CO., LTD. (JP) 2005-08-09 US disclosed
US-20030148214-A1 Resins for resists and chemically amplifiable resist compositions MITSUBISHI CHEMICAL CORPORATION (JP) 2003-08-07 US disclosed
EP-1304340-A1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS Mitsubishi Rayon Co., Ltd. (JP) 2003-04-23 EP disclosed